Inventor

Janneke RAVENSBERGEN

Inventor
DE

Overview

5→
Patents
2023–2025
Patent span
Physics
Primary field (CPC G)

Patents· 5 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

G02Bprimary
G02BOptical elements, systems or apparatus28%
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices28%
C03BManufacture, shaping, or supplementary processes11%
G02FOptical devices or arrangements for the control of light by modification of the optical properties of the media of the elements involved therein11%
G06FElectric digital data processing11%
H01SDevices using the process of light amplification by stimulated emission of radiation [laser] to amplify or generate light11%

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

2023–2025Patents assigned to ASML NETHERLANDS BV (5)· patent assignee history
2023–2025Based in DE· patent location history
2025Based in NL· patent location history

Inventor activity

Assignee and location history derived from the patent record.

Assignees
AssigneePatentsSpan
ASML NETHERLANDS BV52023–2025
Locations
LocationPatentsSpan
DE42023–2025
NL12025