Inventor
Tohru Kiuchi
Inventor
Tokyo, JP
Overview
Patents· 37 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
G03Fprimary
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices37%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1028%
H01LSemiconductor devices5%
B41JTypewriters4%
G03BApparatus or arrangements for taking photographs or for projecting or viewing them4%
Y10TTechnical subjects covered by former us classification4%
B65HHandling thin or filamentary material, e.g. sheets, webs, cables3%
H05KPrinted circuits3%
Y10STechnical subjects covered by former uspc cross-reference art collections [xracs] and digests3%
A63HToys, e.g. tops, dolls, hoops or building blocks1%
PatentTitleYear
11,073,767Substrate processing apparatus, processing apparatus, and method for manufacturing device202110,691,027Substrate processing apparatus, processing apparatus, and method for manufacturing device202010,591,827Substrate processing apparatus, processing apparatus, and method for manufacturing device202010,541,160Substrate case and substrate accommodation apparatus202010,527,945Substrate processing apparatus, processing apparatus, and method for manufacturing device202010,156,795Substrate processing apparatus, processing apparatus, and method for manufacturing device201810,007,190Substrate processing apparatus, processing apparatus, and method for manufacturing device20189,651,868'Substrate processing apparatus, processing apparatus, and method for manufacturing device'20179,193,560'Leader member, substrate, substrate cartridge, substrate-processing apparatus, leader-connecting method, method of manufacturing display element, and apparatus for manufacturing display element'20159,178,155'Flexible substrate, manufacturing method of display element, and manufacturing apparatus of display element'20159,152,062'Pattern forming device, pattern forming method, and device manufacturing method'20159,072,210'Substrate cartridge, substrate processing apparatus, substrate processing system, control apparatus, and method of manufacturing display element'20158,922,748'Exposure apparatus, exposure method, and device manufacturing method'20148,801,307'Substrate cartridge, substrate processing apparatus, substrate processing system, control apparatus, and method of manufacturing display element'20148,780,326'Exposure apparatus, exposure method, and device manufacturing method'20148,743,341'Immersion exposure apparatus and immersion exposure method, and device manufacturing method'20148,605,249'Exposure apparatus, exposure method, and device manufacturing method'20138,508,714'Exposure apparatus, exposure method, and method for producing device'20138,440,375'Exposure method and electronic device manufacturing method'20138,399,263'Method for measuring expansion/contraction, method for processing substrate, method for producing device, apparatus for measuring expansion/contraction, and apparatus for processing substrate'20138,384,875'Exposure apparatus, exposure method, and method for producing device'20138,379,186'Pattern formation apparatus, pattern formation method, and device manufacturing method'20138,289,500'Exposure apparatus, exposure method, and device manufacturing method'20128,264,666'Exposure apparatus, exposure method, and method of manufacturing device'20128,235,695'Pattern forming device, pattern forming method, and device manufacturing method'20128,040,490'Liquid immersion exposure apparatus, exposure method, and method for producing device'20118,013,975'Exposure apparatus, exposure method, and method for producing device'20117,872,730'Immersion exposure apparatus and immersion exposure method, and device manufacturing method'20117,573,052'Exposure apparatus, exposure method, and device manufacturing method'20097,433,019'Exposure apparatus and device manufacturing method'20087,220,160'Gun grip controller'2007RE038320'Projection exposure apparatus wherein focusing of the apparatus is changed by controlling the temperature of a lens element of the projection optical system'20036,583,854'Method and apparatus for the manufacture of circuits for a large display device using stitch exposure'20035,883,704'Projection exposure apparatus wherein focusing of the apparatus is changed by controlling the temperature of a lens element of the projection optical system'19995,872,618'Projection exposure apparatus'19995,583,609'Projection exposure apparatus'19965,162,789'Fluorescent indicator apparatus'1992Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
1992Based in Kariya, JP· patent location history
1996–2021Patents assigned to NIKON CORP (34)· patent assignee history
1996Based in Higashi Kurume, JP· patent location history
1999–2021Based in Tokyo, JP· patent location history
2003–2015Based in Higashikurume, JP· patent location history
2007Based in Kawaguchi, JP· patent location history
2012–2020Patents assigned to KIUCHI TOHRU (17)· patent assignee history
2012–2020Patents assigned to MIZUTANI HIDEO (6)· patent assignee history
2013Patents assigned to INOUE HIDEYA (2)· patent assignee history
2015Patents assigned to HAMADA TOMOHIDE (2)· patent assignee history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| NIKON CORP | 34 | 1996–2021 |
| KIUCHI TOHRUself | 17 | 2012–2020 |
| MIZUTANI HIDEO | 6 | 2012–2020 |
| HAMADA TOMOHIDE | 2 | 2015 |
| INOUE HIDEYA | 2 | 2013 |
Locations
| Location | Patents | Span |
|---|---|---|
| Tokyo, JP | 21 | 1999–2021 |
| Higashikurume, JP | 13 | 2003–2015 |
| Kawaguchi, JP | 1 | 2007 |
| Higashi Kurume, JP | 1 | 1996 |
| Kariya, JP | 1 | 1992 |