Inventor
Zhaozhao ZHU
Inventor
US
Overview
Patents· 22 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
H10Pprimary
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1021%
G01NInvestigating or analysing materials by determining their chemical or physical properties16%
H01LSemiconductor devices15%
H01JElectric discharge tubes or discharge lamps10%
G01BMeasuring length, thickness or similar linear dimensions8%
G05BControl or regulating systems in general7%
LOC147%
Y02PClimate change mitigation technologies in the production or processing of goods5%
C23CCoating metallic material3%
G01JMeasurement of intensity, velocity, spectral content, polarisation, phase or pulse characteristics of infrared, visible or ultraviolet light3%
PatentTitleYear
12,489,022In-situ etch rate and etch rate uniformity detection system202512,469,686Process characterization and correction using optical wall process sensor (OWPS)202512,467,136Process characterization and correction using optical wall process sensor (OWPS)202512,449,379Machine learning model training202512,442,765Transmission corrected plasma emission using in-situ optical reflectometry202512,405,164Spatial optical emission spectroscopy for etch uniformity202512,339,645Estimation of chamber component conditions using substrate measurements202512,283,503Substrate measurement subsystem202512,216,455Chamber component condition estimation using substrate measurements202512,191,176Integrated substrate measurement system to improve manufacturing process performance202512,148,647Integrated substrate measurement system2024D1045923Portion of a display panel with a graphical user interface2024D1045924Portion of a display panel with a graphical user interface202412,031,910Transmission corrected plasma emission using in-situ optical reflectometry2024D1031743Portion of a display panel with a graphical user interface202412,009,191Thin film, in-situ measurement through transparent crystal and transparent substrate within processing chamber wall202411,927,543Multiple reflectometry for measuring etch parameters202411,830,779In-situ etch material selectivity detection system202311,688,616Integrated substrate measurement system to improve manufacturing process performance202311,668,602Spatial optical emission spectroscopy for etch uniformity202311,619,594Multiple reflectometry for measuring etch parameters2023D0977504Portion of a display panel with a graphical user interface2023Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
2023–2025Patents assigned to APPLIED MATERIALS INC (22)· patent assignee history
2023–2025Based in US· patent location history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| APPLIED MATERIALS INC | 22 | 2023–2025 |
Locations
| Location | Patents | Span |
|---|---|---|
| US | 22 | 2023–2025 |