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Inventor

Yoshitomo Nakagawa

Inventor
Tokyo, JP

Overview

20→
Patents
1989–2017
Patent span
Electricity
Primary field (CPC H)

Patents· 20 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

H01Jprimary
H01JElectric discharge tubes or discharge lamps52%
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices18%
G01NInvestigating or analysing materials by determining their chemical or physical properties12%
H05HPlasma technique6%
Y10STechnical subjects covered by former uspc cross-reference art collections [xracs] and digests6%
C23CCoating metallic material3%
G01JMeasurement of intensity, velocity, spectral content, polarisation, phase or pulse characteristics of infrared, visible or ultraviolet light3%
PatentTitleYear
9,820,370'Heat transfer system for an inductively coupled plasma device'20179,726,611'Stabilized ICP emission spectrometer and method of using'20178,274,063'Composite focused ion beam device, process observation method using the same, and processing method'20127,755,065'Focused ion beam apparatus'20106,031,379'Plasma ion mass analyzing apparatus'20006,002,129'Inductively coupled plasma mass spectrometric and spectrochemical analyzer'19995,867,262'Sample introducing device for inductively coupled plasma analyzer'19995,804,821'Plasma ion source mass analyzer'19985,773,823'Plasma ion source mass spectrometer'19985,559,337'Plasma ion source mass analyzing apparatus'19965,477,048'Inductively coupled plasma mass spectrometer'19955,426,299'Inductive plasma mass spectrometer'19955,334,834'Inductively coupled plasma mass spectrometry device'19945,071,671'Process for forming pattern films'19914,999,492'Inductively coupled plasma mass spectrometry apparatus'19914,930,439'Mask-repairing device'19904,902,530'Method of correcting a pattern film'19904,874,460'Method and apparatus for modifying patterned film'19894,874,632'Process for forming pattern film'19894,851,097'Apparatus for repairing a pattern film'1989

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

1989–2000Patents assigned to SEIKO INSTR INC (16)· patent assignee history
1989–2017Based in Tokyo, JP· patent location history
1996–2012Based in Chiba, JP· patent location history
2010–2012Patents assigned to SII NANOTECHNOLOGY INC (2)· patent assignee history
2012Patents assigned to AITA KAZUO (1)· patent assignee history
2012Patents assigned to FUJII TOSHIAKI (1)· patent assignee history
2017Patents assigned to HITACHI HIGH-TECH SCIENCE CORP (2)· patent assignee history

Inventor activity

Assignee and location history derived from the patent record.

Assignees
AssigneePatentsSpan
SEIKO INSTR INC161989–2000
HITACHI HIGH-TECH SCIENCE CORP22017
SII NANOTECHNOLOGY INC22010–2012
AITA KAZUO12012
FUJII TOSHIAKI12012
Locations
LocationPatentsSpan
Tokyo, JP121989–2017
Chiba, JP81996–2012