Inventor

Martinus Wilhelmus Van Den Heuvel

Inventor
Best, NL

Overview

4→
Patents
2010–2015
Patent span
Physics
Primary field (CPC G)

Patents· 4 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

G03Fprimary
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices40%
B01FMixing, e.g. dissolving, emulsifying or dispersing20%
F01NGas-flow silencers or exhaust apparatus for machines or engines in general20%
Y10TTechnical subjects covered by former us classification20%

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

2010–2015Patents assigned to ASML NETHERLANDS BV (4)· patent assignee history
2010–2015Based in Best, NL· patent location history
2014–2015Patents assigned to VAN DEN HEUVEL MARTINUS WILHELMUS (2)· patent assignee history
2014Patents assigned to BERKVENS PAUL PETRUS JOANNES (1)· patent assignee history
2014Patents assigned to DE METSENAERE CHRISTOPHE (1)· patent assignee history
2015Patents assigned to FRANKEN JOHANNES CHRISTIAAN LEONARDUS (1)· patent assignee history

Inventor activity

Assignee and location history derived from the patent record.

Assignees
AssigneePatentsSpan
ASML NETHERLANDS BV42010–2015
VAN DEN HEUVEL MARTINUS WILHELMUSself22014–2015
BERKVENS PAUL PETRUS JOANNES12014
DE METSENAERE CHRISTOPHE12014
FRANKEN JOHANNES CHRISTIAAN LEONARDUS12015
Locations
LocationPatentsSpan
Best, NL42010–2015