Inventor
TAKURO KOSAKA
Inventor
JP
Overview
Patents· 19 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
G03Fprimary
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices43%
C23CCoating metallic material19%
H01LSemiconductor devices8%
H04NPictorial communication, e.g. television8%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h108%
G01JMeasurement of intensity, velocity, spectral content, polarisation, phase or pulse characteristics of infrared, visible or ultraviolet light3%
G01KMeasuring temperature3%
G01SRadio direction-finding3%
G21KHandling of particles or ionising radiation not otherwise provided for3%
H03MCoding3%
PatentTitleYear
12,474,628Reflective mask blank and method for manufacturing reflective mask202512,407,936Solid state imaging element, imaging apparatus, and method for controlling solid state imaging element202512,353,121Reflective mask blank, and reflective mask202512,265,321Reflective mask blank, and method for manufacturing reflective mask202512,207,012Imaging device and electronic apparatus202512,197,121Phase shift mask blank, manufacturing method of phase shift mask, and phase shift mask202512,124,162Substrate with film for reflective mask blank, reflective mask blank, and method for manufacturing reflective mask202412,111,215Imaging device and calibration method202412,050,396Reflective mask blank, method of manufacturing thereof, and reflective mask202411,860,529Substrate with multilayer reflection film for EUV mask blank, manufacturing method thereof, and EUV mask blank202411,835,851Substrate with multilayer reflection film for EUV mask blank, manufacturing method thereof, and EUV mask blank202311,789,357Method of manufacturing reflective mask blank, and reflective mask blank202311,644,743Halftone phase shift-type photomask blank, method of manufacturing thereof, and halftone phase shift-type photomask202311,644,742Phase shift mask blank, manufacturing method thereof, and phase shift mask202311,422,456Phase shift mask blank, method for producing phase shift mask, and phase shift mask202211,415,874Method of manufacturing reflective mask blank, reflective mask blank, and method of manufacturing reflective mask202211,333,965Phase shift mask blank, manufacturing method thereof, and phase shift mask202211,327,393Photomask blank and method for preparing photomask202211,307,490Phase shift mask blank and phase shift mask2022Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
2022–2025Patents assigned to SHINETSU CHEMICAL CO (16)· patent assignee history
2022–2025Based in JP· patent location history
2024–2025Patents assigned to SONY SEMICONDUCTOR SOLUTIONS CORP (3)· patent assignee history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| SHINETSU CHEMICAL CO | 16 | 2022–2025 |
| SONY SEMICONDUCTOR SOLUTIONS CORP | 3 | 2024–2025 |
Locations
| Location | Patents | Span |
|---|---|---|
| JP | 19 | 2022–2025 |