Inventor
HSIAO-LUN CHANG
Inventor
TW
Overview
Patents· 8 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
G03Fprimary
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices53%
H05GX-ray technique33%
G05DSystems for controlling or regulating non-electric variables13%
PatentTitleYear
12,028,959EUV light source and apparatus for EUV lithography202411,997,778Replacement and refill method for droplet generator202411,982,944Method of lithography process and transferring a reticle202411,703,763Method of lithography process using reticle container with discharging device202311,599,030Droplet catcher, droplet catcher system of EUV lithography apparatus, and maintenance method of the EUV lithography apparatus202311,528,798Replacement method for droplet generator202211,470,710EUV light source and apparatus for EUV lithography202211,320,733Reticle with conductive material structure2022Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
2022–2024Patents assigned to TAIWAN SEMICONDUCTOR MFG CO LTD (8)· patent assignee history
2022–2024Based in TW· patent location history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| TAIWAN SEMICONDUCTOR MFG CO LTD | 8 | 2022–2024 |
Locations
| Location | Patents | Span |
|---|---|---|
| TW | 8 | 2022–2024 |