Inventor
Reijiro Shimura
Inventor
Nomi, JP
Overview
Patents· 1 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
H01Lprimary
H01LSemiconductor devices25%
H10BElectronic memory devices25%
H10DInorganic electric semiconductor devices25%
H10NElectric solid-state devices not otherwise provided for25%
PatentTitleYear
10,431,731Method for forming PZT ferroelectric film2019Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
2019Patents assigned to JAPAN ADVANCED INSTITUTE OF SCIENCE AND TECH (1)· patent assignee history
2019Patents assigned to MITSUBISHI MATERIALS CORP (1)· patent assignee history
2019Based in Nomi, JP· patent location history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| JAPAN ADVANCED INSTITUTE OF SCIENCE AND TECH | 1 | 2019 |
| MITSUBISHI MATERIALS CORP | 1 | 2019 |
Locations
| Location | Patents | Span |
|---|---|---|
| Nomi, JP | 1 | 2019 |