Inventor
Dzmitry Labetski
Inventor
Utrecht, NL
Overview
Patents· 19 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
G03Fprimary
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices34%
H05GX-ray technique32%
G21KHandling of particles or ionising radiation not otherwise provided for6%
Y10TTechnical subjects covered by former us classification6%
B05BSpraying apparatus4%
B82YSpecific uses or applications of nanostructures4%
F15DFluid dynamics, i.e. methods or means for influencing the flow of gases or liquids4%
H05KPrinted circuits4%
G01BMeasuring length, thickness or similar linear dimensions2%
G02BOptical elements, systems or apparatus2%
PatentTitleYear
10,955,749Guiding device and associated system202110,394,141Radiation source and lithographic apparatus201910,222,701Radiation source, lithographic apparatus device manufacturing method, sensor system and sensing method20199,753,383'Radiation source and lithographic apparatus'20179,715,174'Droplet generator, EUV radiation source, lithographic apparatus, method for generating droplets and device manufacturing method'20179,671,698'Fuel stream generator, source collector apparatus and lithographic apparatus'20179,363,879'Module and method for producing extreme ultraviolet radiation'20169,310,689'Radiation source and lithographic apparatus'20169,113,539'Radiation source'20159,091,944'Source collector, lithographic apparatus and device manufacturing method'20159,013,679'Collector mirror assembly and method for producing extreme ultraviolet radiation'20158,901,521'Module and method for producing extreme ultraviolet radiation'20148,755,032'Radiation source and lithographic apparatus'20148,749,756'Lithographic apparatus and device manufacturing method'20148,711,325'Method and system for determining a suppression factor of a suppression system and a lithographic apparatus'20148,405,055'Source module, radiation source and lithographic apparatus'20138,368,032'Radiation source, lithographic apparatus, and device manufacturing method'20138,220,315'Gas gauge, lithographic apparatus and device manufacturing method'20128,115,900'Lithographic apparatus and device manufacturing method'2012Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
2012–2021Patents assigned to ASML NETHERLANDS BV (19)· patent assignee history
2012–2016Patents assigned to LABETSKI DZMITRY (12)· patent assignee history
2012–2015Patents assigned to SWINKELS GERARDUS HUBERTUS PETRUS MARIA (8)· patent assignee history
2012–2016Patents assigned to SCHIMMEL HENDRIKUS GIJSBERTUS (6)· patent assignee history
2012–2019Based in Utrecht, NL· patent location history
2012–2021Based in Eindhoven, NL· patent location history
2013–2015Patents assigned to LOOPSTRA ERIK ROELOF (6)· patent assignee history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| ASML NETHERLANDS BV | 19 | 2012–2021 |
| LABETSKI DZMITRYself | 12 | 2012–2016 |
| SWINKELS GERARDUS HUBERTUS PETRUS MARIA | 8 | 2012–2015 |
| LOOPSTRA ERIK ROELOF | 6 | 2013–2015 |
| SCHIMMEL HENDRIKUS GIJSBERTUS | 6 | 2012–2016 |
Locations
| Location | Patents | Span |
|---|---|---|
| Utrecht, NL | 12 | 2012–2019 |
| Eindhoven, NL | 7 | 2012–2021 |