Inventor
Aya Momozawa
Inventor
Kawasaki, JP
Overview
Patents· 4 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
G03Fprimary
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices27%
C08FMacromolecular compounds obtained by reactions only involving carbon-to-carbon unsaturated bonds13%
H01LSemiconductor devices13%
C07CAcyclic or carbocyclic compounds7%
C08LCompositions of macromolecular compounds7%
C23CCoating metallic material7%
C25DProcesses for the electrolytic or electrophoretic production of coatings7%
H05KPrinted circuits7%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h107%
H10WGeneric packages, interconnections, connectors or other constructional details of devices covered by class h107%
PatentTitleYear
10,353,291Method for forming photosensitive resin layer, method for producing photoresist pattern, and method for producing plated molded article201910,261,415Chemically amplified positive-type photosensitive resin composition201910,054,855Chemically amplified positive-type photosensitive resin composition20189,448,478'Chemically amplified positive-type photosensitive resin composition for thick-film application'2016Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
2016–2019Patents assigned to TOKYO OHKA KOGYO CO LTD (4)· patent assignee history
2016–2019Based in Kawasaki, JP· patent location history
2018Based in Kanagawa, JP· patent location history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| TOKYO OHKA KOGYO CO LTD | 4 | 2016–2019 |
Locations
| Location | Patents | Span |
|---|---|---|
| Kawasaki, JP | 3 | 2016–2019 |
| Kanagawa, JP | 1 | 2018 |