Inventor
Jyothi Singh
Inventor
Hopewell Junction, NY, US
Overview
Patents· 14 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
H01Jprimary
H01JElectric discharge tubes or discharge lamps24%
C23CCoating metallic material17%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1014%
Y10STechnical subjects covered by former uspc cross-reference art collections [xracs] and digests14%
G01NInvestigating or analysing materials by determining their chemical or physical properties10%
B24BMachines, devices, or processes for grinding or polishing7%
G01JMeasurement of intensity, velocity, spectral content, polarisation, phase or pulse characteristics of infrared, visible or ultraviolet light7%
G11BInformation storage based on relative movement between record carrier and transducer7%
PatentTitleYear
6,291,833'Apparatus for mapping scratches in an oxide film'20016,048,745'Method for mapping scratches in an oxide film'20005,993,059'Combined emissivity and radiance measurement for determination of temperature of radiant object'19995,953,115'Method and apparatus for imaging surface topography of a wafer'19995,770,097'Control of etch selectivity'19985,738,440'Combined emissivity and radiance measurement for the determination of the temperature of a radiant object'19985,683,538'Control of etch selectivity'19975,534,066'Fluid delivery apparatus having an infrared feedline sensor'19965,492,718'Fluid delivery apparatus and method having an infrared feedline sensor'19965,387,777'Methods and apparatus for contamination control in plasma processing'19955,382,911'Reaction chamber interelectrode gap monitoring by capacitance measurement'19955,367,139'Methods and apparatus for contamination control in plasma processing'19945,308,414'Method and apparatus for optical emission end point detection in plasma etching processes'19944,846,920'Plasma amplified photoelectron process endpoint detection apparatus'1989Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
1989–2001Patents assigned to IBM (14)· patent assignee history
1989–1999Based in Hopewell Junction, NY, US· patent location history
1999–2001Based in Houston, TX, US· patent location history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| IBM | 14 | 1989–2001 |
Locations
| Location | Patents | Span |
|---|---|---|
| Hopewell Junction, New York, US | 11 | 1989–1999 |
| Houston, Texas, US | 3 | 1999–2001 |