Inventor
TOMOHIKO NIIZEKI
Inventor
JP
Overview
Patents· 4 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
H10Pprimary
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1031%
H01JElectric discharge tubes or discharge lamps15%
H01LSemiconductor devices15%
C23CCoating metallic material8%
G06FElectric digital data processing8%
G06NComputing arrangements based on specific computational models8%
G06TImage data processing or generation, in general8%
G06VImage or video recognition or understanding8%
PatentTitleYear
12,537,171Substrate processing method and substrate processing apparatus202612,112,954Etching method, substrate processing apparatus, and substrate processing system202411,922,307Learning device, inference device, and learned model202411,637,003Method for etching film and plasma processing apparatus2023Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
2023–2026Patents assigned to TOKYO ELECTRON LTD (4)· patent assignee history
2023–2026Based in JP· patent location history
2024Patents assigned to PREFERRED NETWORKS INC (1)· patent assignee history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| TOKYO ELECTRON LTD | 4 | 2023–2026 |
| PREFERRED NETWORKS INC | 1 | 2024 |
Locations
| Location | Patents | Span |
|---|---|---|
| JP | 4 | 2023–2026 |