Inventor

HYUN MI KIM

Inventor
KR

Overview

16→
Patents
2022–2026
Patent span
Physics
Primary field (CPC G)

Patents· 16 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

G03Fprimary
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices28%
G06FElectric digital data processing13%
C01BNon-metallic elements9%
H01LSemiconductor devices9%
H10DInorganic electric semiconductor devices9%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h109%
B01JChemical or physical processes, e.g. catalysis or colloid chemistry6%
G06NComputing arrangements based on specific computational models6%
B82YSpecific uses or applications of nanostructures3%
G01NInvestigating or analysing materials by determining their chemical or physical properties3%
PatentTitleYear
12,591,431Artificial intelligence processing apparatus, and data prefetching device and method for artificial intelligence processor202612,379,654Pellicle for extreme ultraviolet lithography202512,326,658Pellicle for extreme ultraviolet lithography containing molybdenum carbide202512,321,092Pellicle for extreme ultraviolet lithography containing amorphous carbon and method for manufacturing the same202512,287,568Low-temperature direct growth method of multilayer graphene, pellicle for extreme ultraviolet lithography using the same, and method for manufacturing the pellicle202512,282,250Pellicle for extreme ultraviolet lithography based on yttrium202512,248,243Multilayer graphene direct growth method and method for manufacturing pellicle for extreme ultraviolet lithography using the same202512,210,952Reorganizable data processing array for neural network computing202512,205,986Nanoscale thin film structure and implementing method thereof202512,105,628Apparatus and method for managing cache memory including cache lines with variable cache line configuration202411,927,881Pellicle for extreme ultraviolet lithography based on yttrium carbide202411,847,465Parallel processor, address generator of parallel processor, and electronic device including parallel processor202311,789,359Method for manufacturing pellicle for extreme ultraviolet lithography having graphene defect healing layer202311,543,376Method for manufacturing sample for thin film property measurement and analysis, and sample manufactured thereby202311,507,429Neural network accelerator including bidirectional processing element array202211,392,049Pellicle for extreme ultraviolet lithography2022

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

2022–2025Patents assigned to KOREA ELECTRONICS TECHNOLOGY (9)· patent assignee history
2022–2026Patents assigned to ELECTRONICS & TELECOMMUNICATIONS RES INST (5)· patent assignee history
2022–2026Based in KR· patent location history
2023Patents assigned to SEOUL NAT UNIV R&DB FOUNDATION (1)· patent assignee history
2025Patents assigned to KOREA ADVANCED NANO FAB CENTER (1)· patent assignee history

Inventor activity

Assignee and location history derived from the patent record.

Assignees
AssigneePatentsSpan
KOREA ELECTRONICS TECHNOLOGY92022–2025
ELECTRONICS & TELECOMMUNICATIONS RES INST52022–2026
KOREA ADVANCED NANO FAB CENTER12025
SEOUL NAT UNIV R&DB FOUNDATION12023
Locations
LocationPatentsSpan
KR162022–2026