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Inventor

HAE KYUNG KIM

Inventor
KR

Overview

2→
Patents
2026
Patent span
Electricity
Primary field (CPC H)

Patents· 2 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

G03Fprimary
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices22%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1022%
B05BSpraying apparatus11%
B05CApparatus for applying fluent materials to surfaces, in general11%
F04BPositive-displacement machines for liquids11%
F04FPumping of fluid by direct contact of another fluid or by using inertia of fluid to be pumped11%
H01LSemiconductor devices11%
PatentTitleYear
12,593,645Liquid trap tank and liquid supply unit for the liquid trap tank202612,528,098Apparatus for pressurizing photoresist and system for supplying photoresist2026

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

2026Patents assigned to SEMES CO LTD (2)· patent assignee history
2026Based in KR· patent location history

Inventor activity

Assignee and location history derived from the patent record.

Assignees
AssigneePatentsSpan
SEMES CO LTD22026
Locations
LocationPatentsSpan
KR22026