Inventor
Shingo Hishiya
Inventor
Nirasaki, JP
Overview
Patents· 19 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
H10Pprimary
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1030%
C23CCoating metallic material18%
H10DInorganic electric semiconductor devices14%
H01LSemiconductor devices11%
H10BElectronic memory devices7%
H10WGeneric packages, interconnections, connectors or other constructional details of devices covered by class h105%
B05DProcesses for applying fluent materials to surfaces, in general4%
B05CApparatus for applying fluent materials to surfaces, in general2%
C23FNon-mechanical removal of metallic material from surface2%
C30BSingle-crystal growth2%
PatentTitleYear
10,968,515Vertical heat treatment apparatus202110,964,530Method of forming blocking silicon oxide film, and storage medium202110,553,686Method and apparatus for forming silicon oxide film, and storage medium20209,776,202'Driving method of vertical heat treatment apparatus, storage medium and vertical heat treatment apparatus'20179,562,285'Film forming method, film forming apparatus and storage medium'20178,896,097'Method of manufacturing capacitor, capacitor and method of forming dielectric film for use in capacitor'20148,815,112'Liquid processing method, recording medium having recorded program for executing liquid processing method therein and liquid processing apparatus'20148,735,304'Film forming method, film forming apparatus, and storage medium'20148,642,127'Method of forming titanium nitride film'20148,389,421'Film formation method and film formation apparatus'20138,288,241'Semiconductor device, method of manufacturing the same and adsorption site blocking atomic layer deposition method'20128,216,378'Reaction tube and heat processing apparatus for a semiconductor process'20128,122,850'Method and apparatus for processing polysilazane film'20127,563,481'Method and apparatus for processing polysilazane film'20097,465,682'Method and apparatus for processing organosiloxane film'20087,259,026'Method and apparatus for processing organosiloxane film'20077,208,428'Method and apparatus for treating article to be treated'20077,064,084'Oxide film forming method'20066,821,566'Method and apparatus for forming insulating film containing silicon oxy-nitride'2004Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
2004–2021Patents assigned to TOKYO ELECTRON LTD (19)· patent assignee history
2004–2021Based in Nirasaki, JP· patent location history
2007–2012Based in Tokyo, JP· patent location history
2012–2014Patents assigned to HISHIYA SHINGO (7)· patent assignee history
2012–2014Patents assigned to MOROZUMI YUICHIRO (5)· patent assignee history
2012–2014Patents assigned to ELPIDA MEMORY INC (2)· patent assignee history
2013–2014Patents assigned to HARADA KATSUSHIGE (3)· patent assignee history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| TOKYO ELECTRON LTD | 19 | 2004–2021 |
| HISHIYA SHINGOself | 7 | 2012–2014 |
| MOROZUMI YUICHIRO | 5 | 2012–2014 |
| HARADA KATSUSHIGE | 3 | 2013–2014 |
| ELPIDA MEMORY INC | 2 | 2012–2014 |
Locations
| Location | Patents | Span |
|---|---|---|
| Nirasaki, JP | 15 | 2004–2021 |
| Tokyo, JP | 4 | 2007–2012 |