Inventor

Xiaojiang Pan

Inventor
San Diego, CA, US

Overview

24→
Patents
2000–2021
Patent span
Physics
Primary field (CPC G)

Patents· 24 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

H01Sprimary
H01SDevices using the process of light amplification by stimulated emission of radiation [laser] to amplify or generate light19%
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices18%
G06TImage data processing or generation, in general11%
G06KGraphical data reading7%
A61BDiagnosis5%
A61NElectrotherapy5%
H04NPictorial communication, e.g. television5%
G01JMeasurement of intensity, velocity, spectral content, polarisation, phase or pulse characteristics of infrared, visible or ultraviolet light4%
G02BOptical elements, systems or apparatus4%
B82YSpecific uses or applications of nanostructures3%
PatentTitleYear
11,011,819Directional coupler and method for manufacturing the same as well as radio transmitter and radio device202110,438,349Systems, devices, and methods for tracking and compensating for patient motion during a medical imaging scan201910,339,654Systems, devices, and methods for tracking moving targets201910,327,708Systems, devices, and methods for tracking and compensating for patient motion during a medical imaging scan20199,779,502'Systems, devices, and methods for tracking moving targets'20179,734,589'Systems, devices, and methods for tracking and compensating for patient motion during a medical imaging scan'20179,717,461'Systems, devices, and methods for tracking and compensating for patient motion during a medical imaging scan'20179,607,377'Systems, devices, and methods for tracking moving targets'20179,305,365'Systems, devices, and methods for tracking moving targets'20167,346,093'DUV light source optical element improvements'20087,291,853'Discharge produced plasma EUV light source'20077,217,940'Collector for EUV light source'20077,016,388'Laser lithography light source with beam delivery'20066,904,073'High power deep ultraviolet laser with long life optics'20056,839,372'Gas discharge ultraviolet laser with enclosed beam path with added oxidizer'20056,757,316'Four KHz gas discharge laser'20046,693,939'Laser lithography light source with beam delivery'20046,567,450'Very narrow band, two chamber, high rep rate gas discharge laser system'20036,539,042'Ultra pure component purge system for gas discharge laser'20036,529,321'Protective overcoat for replicated diffraction gratings'20036,511,703'Protective overcoat for replicated diffraction gratings'20036,466,601'Beam seal for line narrowed production laser'20026,359,922'Single chamber gas discharge laser with line narrowed seed beam'20026,109,574'Gas laser chamber/optics support structure'2000

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

2000–2008Patents assigned to CYMER INC (15)· patent assignee history
2000–2019Based in San Diego, CA, US· patent location history
2016–2019Patents assigned to KINETICOR INC (8)· patent assignee history
2021Patents assigned to ERICSSON TELEFON AB L M (1)· patent assignee history
2021Based in Nanjing, CN· patent location history

Inventor activity

Assignee and location history derived from the patent record.

Assignees
AssigneePatentsSpan
CYMER INC152000–2008
KINETICOR INC82016–2019
ERICSSON TELEFON AB L M12021
Locations
LocationPatentsSpan
San Diego, California, US232000–2019
Nanjing, CN12021