Inventor
Richard L. Guldi
Inventor
Dallas, TX, US
Overview
Patents· 53 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
H10Pprimary
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1027%
Y10STechnical subjects covered by former uspc cross-reference art collections [xracs] and digests20%
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices7%
H10DInorganic electric semiconductor devices7%
B08BCleaning in general5%
H10WGeneric packages, interconnections, connectors or other constructional details of devices covered by class h105%
G01NInvestigating or analysing materials by determining their chemical or physical properties3%
G05BControl or regulating systems in general3%
G01RMeasuring electric variables2%
H01JElectric discharge tubes or discharge lamps2%
PatentTitleYear
8,273,523'By-die-exposure for patterning of holes in edge die'20128,273,645'Method to attain low defectivity fully silicided gates'20127,897,410'Close proximity scanning surface contamination analyzer'20117,772,867'Structures for testing and locating defects in integrated circuits'20107,601,629'Semiconductive device fabricated using subliming materials to form interlevel dielectrics'20097,598,507'Adjustable lithography blocking device and method'20097,596,456'Method and apparatus for cassette integrity testing using a wafer sorter'20097,579,541'Automatic page sequencing and other feedback action based on analysis of audio performance data'20097,374,866'System and method for exposure of partial edge die'20087,228,193'Methods for detecting structure dependent process defects'20077,212,607'X-ray confocal defect detection systems and methods'20077,171,035'Alignment mark for e-beam inspection of a semiconductor wafer'20077,112,540'Pretreatment for an electroplating process and an electroplating process in including the pretreatment'20067,024,950'Method for intelligent sampling of particulates in exhaust lines'20066,975,920'In-situ randomization and recording of wafer processing order at process tools'20056,967,110'Sensitive test structure for assessing pattern anomalies'20056,862,495'In-situ randomization and recording of wafer processing order at process tools'20056,848,066'Error reduction in semiconductor processes'20056,834,117'X-ray defect detection in integrated circuit metallization'20046,710,364'Semiconductor wafer edge marking'20046,689,686'System and method for electroplating fine geometries'20046,684,125'In-situ randomization and recording of wafer processing order at process tools'20046,645,684'Error reduction in semiconductor processes'20036,572,461'Method for producing wafer notches with rounded corners and a tool therefor'20036,488,037'Programmable physical action during integrated circuit wafer cleanup'20026,448,154'Method for producing wafers with rounded corners in the notches used for alignment in the fabrication of semiconductor devices'20026,442,867'Apparatus and method for cleaning a vertical furnace pedestal and cap'20026,420,792'Semiconductor wafer edge marking'20026,395,102'Method and apparatus for in-situ reticle cleaning at photolithography tool'20026,305,097'Apparatus for in-situ reticle cleaning at photolithography tool'20016,298,282'Robot crash sensor system'20016,267,122'Semiconductor cleaning solution and method'20016,267,894'Method for efficient filtration of chemical baths'20016,239,003'Method of simultaneous fabrication of isolation and gate regions in a semiconductor device'20016,202,318'System for processing wafers and cleaning wafer-handling implements'20016,197,123'Method for cleaning a process chamber used for manufacturing substrates during nonproduction intervals'20016,180,424'Method for improving wafer sleuth capability by adding wafer rotation tracking'20016,174,817'Two step oxide removal for memory cells'20016,096,100'Method for processing wafers and cleaning wafer-handling implements'20006,067,163'Automated substrate pattern recognition system'20005,958,517'System and method for cleaning nozzle delivering spin-on-glass to substrate'19995,841,543'Method and apparatus for verifying the presence of a material applied to a substrate'19985,839,455'Enhanced high pressure cleansing system for wafer handling implements'19985,698,038'Method for wafer carrier cleaning'19975,698,040'Method for rotational wafer cleaning in solution'19975,576,230'Method of fabrication of a semiconductor device having a tapered implanted region'19965,551,165'Enhanced cleansing process for wafer handling implements'19965,547,891'Structural modification to enhance DRAM gate oxide quality'19965,535,471'Tool for cleaning LPCVD furnace tube'19965,525,529'Method for reducing dopant diffusion'19965,520,205'Apparatus for wafer cleaning with rotation'19965,506,169'Method for reducing lateral dopant diffusion'19965,334,556'Method for improving gate oxide integrity using low temperature oxidation during source/drain anneal'1994Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
1994–2012Patents assigned to TEXAS INSTRUMENTS INC (53)· patent assignee history
1994–2012Based in Dallas, TX, US· patent location history
2012Patents assigned to GULDI RICHARD L (2)· patent assignee history
2012Patents assigned to ATKINSON CHRIS D (1)· patent assignee history
2012Patents assigned to CHATTERJEE BASAB (1)· patent assignee history
2012Patents assigned to DETWEILER SHANGTING (1)· patent assignee history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| TEXAS INSTRUMENTS INC | 53 | 1994–2012 |
| GULDI RICHARD Lself | 2 | 2012 |
| ATKINSON CHRIS D | 1 | 2012 |
| CHATTERJEE BASAB | 1 | 2012 |
| DETWEILER SHANGTING | 1 | 2012 |
Locations
| Location | Patents | Span |
|---|---|---|
| Dallas, Texas, US | 53 | 1994–2012 |