Inventor
Sota Nakagawa
Inventor
Kanagawa, JP
Overview
Patents· 5 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
C02Fprimary
C02FTreatment of water, waste water, sewage, or sludge12%
B01FMixing, e.g. dissolving, emulsifying or dispersing6%
B01JChemical or physical processes, e.g. catalysis or colloid chemistry6%
B24BMachines, devices, or processes for grinding or polishing6%
B41JTypewriters6%
B64CAeroplanes6%
C11DDetergent compositions6%
C23CCoating metallic material6%
G05BControl or regulating systems in general6%
G05DSystems for controlling or regulating non-electric variables6%
PatentTitleYear
11,052,661Liquid ejecting apparatus and cleaning device202110,967,954Electric actuator driving and controlling device, and aircraft20217,305,275'Material supply system in semiconductor device manufacturing plant'20076,713,771'Method and apparatus for electromagnetic irradiation of liquid'20046,077,424'Method for aerobically treating wastewater and a treatment tank for such method'2000Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
2000–2007Patents assigned to EBARA CORP (3)· patent assignee history
2000–2007Based in Kanagawa, JP· patent location history
2004Based in Tokyo, JP· patent location history
2021Patents assigned to NABTESCO CORP (1)· patent assignee history
2021Patents assigned to SEIKO EPSON CORP (1)· patent assignee history
2021Based in Kamiina-gun, JP· patent location history
2021Based in Gifu, JP· patent location history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| EBARA CORP | 3 | 2000–2007 |
| NABTESCO CORP | 1 | 2021 |
| SEIKO EPSON CORP | 1 | 2021 |
Locations
| Location | Patents | Span |
|---|---|---|
| Kanagawa, JP | 2 | 2000–2007 |
| Kamiina-gun, JP | 1 | 2021 |
| Gifu, JP | 1 | 2021 |
| Tokyo, JP | 1 | 2004 |