Inventor

Marinus Maria Johannes Van De Wal

Inventor
Oirschot, NL

Overview

5→
Patents
2014–2018
Patent span
Physics
Primary field (CPC G)

Patents· 5 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

G03Fprimary
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices63%
G05BControl or regulating systems in general13%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1013%
Y02PClimate change mitigation technologies in the production or processing of goods13%

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

2014–2018Patents assigned to ASML NETHERLANDS BV (5)· patent assignee history
2014–2015Patents assigned to VAN DE WAL MARINUS MARIA JOHANNES (2)· patent assignee history
2014–2018Based in Oirschot, NL· patent location history
2015Patents assigned to AANGENENT WILHELMUS HENRICUS THEODORUS MARIA (1)· patent assignee history
2015Patents assigned to AKKERMANS JOHANNES ANTONIUS GERARDUS (1)· patent assignee history
2015Patents assigned to BEERENS RUUD ANTONIUS CATHARINA MARIA (1)· patent assignee history
2015Based in Olrschot, NL· patent location history

Inventor activity

Assignee and location history derived from the patent record.

Assignees
AssigneePatentsSpan
ASML NETHERLANDS BV52014–2018
VAN DE WAL MARINUS MARIA JOHANNESself22014–2015
AANGENENT WILHELMUS HENRICUS THEODORUS MARIA12015
AKKERMANS JOHANNES ANTONIUS GERARDUS12015
BEERENS RUUD ANTONIUS CATHARINA MARIA12015
Locations
LocationPatentsSpan
Oirschot, NL42014–2018
Olrschot, NL12015