Inventor

Horst Muenzel

Inventor
Reutlingen, DE

Overview

26→
Patents
1991–2012
Patent span
Physics
Primary field (CPC G)

Patents· 26 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

G01Pprimary
G01PMeasuring linear or angular speed, acceleration, deceleration, or shock29%
G01LMeasuring force, stress, torque, work, mechanical power, mechanical efficiency, or fluid pressure13%
B81BMicrostructural devices or systems, e.g. micromechanical devices9%
Y10STechnical subjects covered by former uspc cross-reference art collections [xracs] and digests9%
B81CProcesses or apparatus specially adapted for the manufacture or treatment of microstructural devices or systems7%
G01CMeasuring distances, levels or bearings7%
G01HMeasurement of mechanical vibrations or ultrasonic, sonic or infrasonic waves5%
G01FMeasuring volume, volume flow, mass flow or liquid level4%
B29CShaping or joining of plastics2%
B60CVehicle tyres2%
PatentTitleYear
8,245,571'Component and production method for a component'20127,394,349'Device and method to detect presence in a motor vehicle'20086,656,368'Nonstick layer for a micromechanical component'20036,465,854'Micromechanical component'20026,318,175'Micromechanical sensor and method for the manufacture thereof'20016,268,232'Method for fabricating a micromechanical component'20016,214,243'Process for producing a speed of rotation coriolis sensor'20016,140,709'Bonding pad structure and method for manufacturing the bonding pad structure'20006,117,701'Method for manufacturing a rate-of-rotation sensor'20006,106,735'Wafer stack and method of producing sensors'20006,076,404'Micromechanical sensor including a single-crystal silicon support'20006,055,858'Acceleration sensor'20005,959,208'Acceleration sensor'19995,723,353'Process for manufacturing a sensor'19985,721,377'Angular velocity sensor with built-in limit stops'19985,705,745'Mass flow sensor'19985,703,287'Measuring element for a flow sensor'19975,629,538'Semiconductor sensor having a protective layer'19975,616,523'Method of manufacturing sensor'19975,616,514'Method of fabricating a micromechanical sensor'19975,569,852'Capacitive accelerometer sensor and method for its manufacture'19965,542,558'Method for manufacturing micro-mechanical components using selective anodization of silicon'19965,507,186'Pressure sensor'19965,461,917'Acceleration sensor'19955,421,952'Method for the manufacture of silicon injection plates and silicon plates produced thereby'19955,071,510'Process for anisotropic etching of silicon plates'1991

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

1991–2012Patents assigned to BOSCH GMBH ROBERT (25)· patent assignee history
1991–2008Based in Reutlingen, DE· patent location history
1999Patents assigned to GMBH ROBERT BOSCH (1)· patent assignee history
2012Patents assigned to GOMEZ UDO-MARTIN (1)· patent assignee history
2012Patents assigned to MUENZEL HORST (1)· patent assignee history
2012Patents assigned to PANNEK THORSTEN (1)· patent assignee history
2012Based in Palo Alto, CA, US· patent location history

Inventor activity

Assignee and location history derived from the patent record.

Assignees
AssigneePatentsSpan
BOSCH GMBH ROBERT251991–2012
GMBH ROBERT BOSCH11999
GOMEZ UDO-MARTIN12012
MUENZEL HORSTself12012
PANNEK THORSTEN12012
Locations
LocationPatentsSpan
Reutlingen, DE251991–2008
Palo Alto, California, US12012