Inventor
Kohei Ishida
Inventor
Suwa, JP
Overview
Patents· 22 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
G02Fprimary
G02FOptical devices or arrangements for the control of light by modification of the optical properties of the media of the elements involved therein13%
B41JTypewriters11%
B29CShaping or joining of plastics7%
B33YAdditive manufacturing, i.e. manufacturing of three-dimensional [3d] objects by additive deposition, additive agglomeration or additive layering, e.g. by 3d printing, stereolithography or selective laser sintering7%
G01NInvestigating or analysing materials by determining their chemical or physical properties7%
H10KOrganic electric solid-state devices7%
B29LIndexing scheme associated with subclass b29c, relating to particular articles4%
C12QMeasuring or testing processes involving enzymes, nucleic acids or microorganisms4%
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices4%
G06FElectric digital data processing4%
PatentTitleYear
10,501,653Pretreatment liquid, ink set, and recording method20199,595,675'Light emitting element with improved layer thickness uniformity'20179,490,456'Method of manufacturing organic EL element, organic EL element, organic EL apparatus, and electronic device'20169,151,986'Discharge method, continuous film formation method, alignment film formation method, method for forming liquid crystal display device, head unit, droplet discharge device, and electronic apparatus'20158,956,563'Molding method and molding apparatus'20158,696,344'Molding method and molding apparatus'20148,456,849'Conductive film stacked member, electro-optical device, and electronic apparatus'20138,444,448'Manufacturing methods of touch panel, display device, and electronic apparatus'20138,425,816'Shaping slurry and shaping method'20138,353,588'Drawing device'20138,236,391'Composition for forming alignment film, and method for manufacturing liquid crystal device'20127,963,622'Liquid discharging device and electro optic device'20117,753,482'Pattern forming method, liquid droplet discharging apparatus, and electrooptical device'20107,726,761'Pattern forming method, droplet ejecting device, and electro-optic device'20107,656,084'Method of producing laminated type organic electroluminescent element and display apparatus'20107,575,774'Film formation method and orientation film formation method'20096,830,551'Body fluid measuring instrument and body fluid sampler thereof'20046,827,829'Test strip for a concentration measuring apparatus biosensor system'20046,599,406'Concentration measuring apparatus, test strip for the concentration measuring apparatus, biosensor system and method for forming terminal on the test strip'20036,354,358'Continuous casting mold with tungsten alloy plating and method of producing the same'20026,125,292'Sensor and a set of sensors'20005,158,748'Automated dispensing and diluting system'1992Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
2000–2004Patents assigned to KYOTO DAIICHI KAGAKU KK (3)· patent assignee history
2002Based in Osaka, JP· patent location history
2003–2004Based in Kyoto, JP· patent location history
2009–2019Patents assigned to SEIKO EPSON CORP (16)· patent assignee history
2009–2015Based in Nagano, JP· patent location history
2010–2017Based in Suwa, JP· patent location history
2012–2015Patents assigned to ISHIDA KOHEI (7)· patent assignee history
2013–2014Patents assigned to HIRAI TOSHIMITSU (3)· patent assignee history
2013–2014Patents assigned to OKAMOTO EIJI (3)· patent assignee history
2019Based in Matsumoto, JP· patent location history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| SEIKO EPSON CORP | 16 | 2009–2019 |
| ISHIDA KOHEIself | 7 | 2012–2015 |
| HIRAI TOSHIMITSU | 3 | 2013–2014 |
| KYOTO DAIICHI KAGAKU KK | 3 | 2000–2004 |
| OKAMOTO EIJI | 3 | 2013–2014 |
Locations
| Location | Patents | Span |
|---|---|---|
| Suwa, JP | 11 | 2010–2017 |
| Nagano, JP | 4 | 2009–2015 |
| Kyoto, JP | 3 | 2003–2004 |
| Matsumoto, JP | 1 | 2019 |
| Osaka, JP | 1 | 2002 |