Inventor

Dirk-Jan Bijvoet

Inventor

Eindhoven, NL

Overview

2006–2015

Patent span

Physics

Primary field (CPC G)

Patents· 20 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

G03Fprimary

G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices71%

H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1018%

Y10STechnical subjects covered by former uspc cross-reference art collections [xracs] and digests7%

G03BApparatus or arrangements for taking photographs or for projecting or viewing them4%

PatentTitleYear

8,928,860'Lithographic apparatus having a chuck with a visco-elastic damping layer'2015 8,830,442'Servo control system, lithographic apparatus and control method'2014 8,400,617'Lithographic apparatus having a substrate support with open cell plastic foam parts'2013 8,384,881'Lithographic apparatus, stage apparatus and device manufacturing method'2013 8,345,265'Lithographic apparatus and methods for compensating substrate unflatness, determining the effect of patterning device unflatness, and determining the effect of thermal loads on a patterning device'2013 8,330,940'Lithographic apparatus, device manufacturing method and position control method'2012 7,933,000'Device manufacturing method, method for holding a patterning device and lithographic apparatus including an applicator for applying molecules onto a clamp area of a patterning device'2011 7,884,919'Lithographic apparatus and device manufacturing method'2011 7,733,463'Lithographic apparatus and device manufacturing method'2010 7,675,607'Lithographic apparatus and device manufacturing method'2010 7,633,600'Lithographic apparatus and device manufacturing method'2009 7,525,636'Lithographic apparatus and exposure method'2009 7,459,701'Stage apparatus, lithographic apparatus and device manufacturing method'2008 7,408,615'Lithographic apparatus and device manufacturing method'2008 7,372,549'Lithographic apparatus and device manufacturing method'2008 7,355,677'System and method for an improved illumination system in a lithographic apparatus'2008 7,349,067'Lithographic apparatus and device manufacturing method'2008 7,345,736'Lithographic apparatus and device manufacturing method'2008 7,151,591'Alignment system, alignment method, and lithographic apparatus'2006 7,106,420'Lithographic apparatus and device manufacturing method'2006

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

2006–2015Patents assigned to ASML NETHERLANDS BV (19)· patent assignee history

2006–2015Based in Eindhoven, NL· patent location history

2012–2015Patents assigned to BIJVOET DIRK-JAN (6)· patent assignee history

2013Patents assigned to AARTS IGOR MATHEUS PETRONELLA (1)· patent assignee history

2014–2015Patents assigned to DE VOS YOUSSEF KAREL MARIA (2)· patent assignee history

2014–2015Patents assigned to KAMIDI RAMIDIN IZAIR (2)· patent assignee history

Inventor activity

Assignee and location history derived from the patent record.

Assignees

Assignee	Patents	Span
ASML NETHERLANDS BV	19	2006–2015
BIJVOET DIRK-JANself	6	2012–2015
DE VOS YOUSSEF KAREL MARIA	2	2014–2015
KAMIDI RAMIDIN IZAIR	2	2014–2015
AARTS IGOR MATHEUS PETRONELLA	1	2013

Locations

Location	Patents	Span
Eindhoven, NL	20	2006–2015