Inventor

Meidong Wang

Inventor
Willington, CT, US

Overview

3→
Patents
2009–2012
Patent span
Chemistry
Primary field (CPC C)

Patents· 3 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

B01Jprimary
B01JChemical or physical processes, e.g. catalysis or colloid chemistry17%
B82YSpecific uses or applications of nanostructures17%
C01BNon-metallic elements17%
C02FTreatment of water, waste water, sewage, or sludge17%
B01DSeparation8%
C01GCompounds containing metals not covered by subclasses c01d or c01f8%
C01PIndexing scheme relating to structural and physical aspects of solid inorganic compounds8%
Y10STechnical subjects covered by former uspc cross-reference art collections [xracs] and digests8%

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

2009–2012Patents assigned to INFRAMAT CORP (3)· patent assignee history
2009–2010Based in Willington, CT, US· patent location history
2010–2012Patents assigned to UNIV HOUSTON (2)· patent assignee history
2012Patents assigned to CHEN HUIMIN (1)· patent assignee history
2012Patents assigned to CLIFFORD DENNIS A (1)· patent assignee history
2012Patents assigned to WANG MEIDONG (1)· patent assignee history
2012Based in Amherst, NY, US· patent location history

Inventor activity

Assignee and location history derived from the patent record.

Assignees
AssigneePatentsSpan
INFRAMAT CORP32009–2012
UNIV HOUSTON22010–2012
CHEN HUIMIN12012
CLIFFORD DENNIS A12012
WANG MEIDONGself12012
Locations
LocationPatentsSpan
Willington, CT, US22009–2010
Amherst, New York, US12012