Inventor

Fidelus Adrianus Boon

Inventor
Bavel, NL

Overview

10→
Patents
1988–2019
Patent span
Physics
Primary field (CPC G)

Patents· 10 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

G03Fprimary
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices32%
H02KDynamo-electric machines18%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1014%
F04BPositive-displacement machines for liquids9%
F16CShafts9%
H01FMagnets9%
G02BOptical elements, systems or apparatus5%
G05DSystems for controlling or regulating non-electric variables5%

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

1988–1993Patents assigned to PHILIPS CORP (3)· patent assignee history
1988–1993Based in Eindhoven, NL· patent location history
1991Based in Eindoven, NL· patent location history
2013–2019Patents assigned to ASML NETHERLANDS BV (6)· patent assignee history
2013–2014Patents assigned to BOON FIDELUS ADRIANUS (3)· patent assignee history
2013–2019Based in Bavel, NL· patent location history
2014Patents assigned to BUIS EDWIN JOHAN (2)· patent assignee history
2014Patents assigned to DE VRIES GOSSE CHARLES (2)· patent assignee history

Inventor activity

Assignee and location history derived from the patent record.

Assignees
AssigneePatentsSpan
ASML NETHERLANDS BV62013–2019
BOON FIDELUS ADRIANUSself32013–2014
PHILIPS CORP31988–1993
BUIS EDWIN JOHAN22014
DE VRIES GOSSE CHARLES22014
Locations
LocationPatentsSpan
Bavel, NL72013–2019
Eindhoven, NL21988–1993
Eindoven, NL11991