Inventor

Bruce E. Adams

Inventor
Portland, OR, US

Overview

72→
Patents
1979–2020
Patent span
Electricity
Primary field (CPC H)

Patents· 72 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

H10Pprimary
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1026%
B23KSoldering or unsoldering17%
G01JMeasurement of intensity, velocity, spectral content, polarisation, phase or pulse characteristics of infrared, visible or ultraviolet light9%
G02BOptical elements, systems or apparatus9%
H01LSemiconductor devices9%
G01NInvestigating or analysing materials by determining their chemical or physical properties4%
H01SDevices using the process of light amplification by stimulated emission of radiation [laser] to amplify or generate light3%
C21DModifying the physical structure of ferrous metals3%
G01BMeasuring length, thickness or similar linear dimensions3%
F27BFurnaces, kilns, ovens or retorts in general2%
PatentTitleYear
10,857,623Annealing apparatus using two wavelengths of radiation202010,234,772Overlay error correction201910,181,409Thermal processing apparatus201910,147,623Pyrometry filter for thermal process chamber201810,074,538Methods for crystallizing a substrate using a plurality of laser pulses and freeze periods20189,958,709Dynamic optical valve for mitigating non-uniform heating in laser processing20189,953,851Process sheet resistance uniformity improvement using multiple melt laser exposures20189,927,622'Multiple beam combiner for laser processing apparatus'20189,908,200'Apparatus and method of improving beam shaping and beam homogenization'20189,864,280'Overlay error correction'20189,839,976'Annealing apparatus using two wavelengths of radiation'20179,786,529'Pyrometry filter for thermal process chamber'20179,579,750'Particle control in laser processing systems'20179,390,926'Process sheet resistance uniformity improvement using multiple melt laser exposures'20169,373,511'Methods for crystallizing a substrate using energy pulses and freeze periods'20169,285,595'Multiple beam combiner for laser processing apparatus'20169,146,337'Apparatus for speckle reduction, pulse stretching, and beam homogenization'20158,970,963'Multiple beam combiner for laser processing apparatus'20158,907,247'Annealing apparatus using two wavelengths of laser radiation'20148,890,024'Annealing apparatus using two wavelengths of continuous wave laser radiation'20148,829,392'Apparatus and method of improving beam shaping and beam homogenization'20148,815,719'Defect-free junction formation using octadecaborane self-amorphizing implants'20148,785,815'Aperture control of thermal processing radiation'20148,765,618'Annealing apparatus using two wavelengths of continuous wave laser radiation'20148,693,095'Method and apparatus for decorrelation of spatially and temporally coherent light'20148,653,408'Annealing apparatus using two wavelengths of continuous wave laser radiation'20148,586,893'Rapid detection of imminent failure in optical thermal processing of a substrate'20138,582,962'Substrate processing chamber with dielectric barrier discharge lamp assembly'20138,569,187'Thermal processing apparatus'20138,541,680'Photovoltaic cells including peaks and methods of manufacture'20138,461,022'Methods and apparatus for aligning a substrate in a process chamber'20138,432,613'Multi-stage optical homogenization'20138,367,983'Apparatus including heating source reflective filter for pyrometry'20138,363,320'Method and apparatus for decorrelation of spatially and temporally coherent light'20138,330,040'Photovoltaic cells including spaced ramps and methods of manufacture'20128,247,317'Methods of solid phase recrystallization of thin film using pulse train annealing method'20128,242,407'Annealing apparatus using two wavelengths of continuous wave laser radiation'20128,232,503'Pyrometer for laser annealing system'20128,222,574'Temperature measurement and control of wafer support in thermal processing chamber'20128,148,663'Apparatus and method of improving beam shaping and beam homogenization'20128,147,137'Pyrometry for substrate processing'20127,978,964'Substrate processing chamber with dielectric barrier discharge lamp assembly'20117,906,402'Compensation techniques for substrate heating processes'20117,867,868'Absorber layer candidates and techniques for application'20117,860,379'Temperature measurement and control of wafer support in thermal processing chamber'20107,804,042'Pryometer for laser annealing system compatible with amorphous carbon optical absorber layer'20107,795,816'High speed phase scrambling of a coherent beam using plasma'20107,772,134'Method of annealing using two wavelengths of continuous wave laser radiation'20107,717,617'Multiple band pass filtering for pyrometry in laser based annealing systems'20107,598,150'Compensation techniques for substrate heating processes'20097,595,208'Method of laser annealing using two wavelengths of radiation'20097,494,272'Dynamic surface annealing using addressable laser array with pyrometry feedback'20097,440,088'Methods and devices for measuring a concentrated light beam'20087,438,468'Multiple band pass filtering for pyrometry in laser based annealing systems'20087,422,988'Rapid detection of imminent failure in laser thermal processing of a substrate'20087,398,693'Adaptive control method for rapid thermal processing of a substrate'20087,279,721'Dual wavelength thermal flux laser anneal'20077,135,392'Thermal flux laser annealing for ion implantation of semiconductor P-N junctions'20067,129,440'Single axis light pipe for homogenizing slow axis of illumination systems based on laser diodes'20066,839,507'Black reflector plate'20056,406,179'Sensor for measuring a substrate temperature'20026,183,130'Apparatus for substrate temperature measurement using a reflecting cavity and detector'20015,769,540'Non-contact optical techniques for measuring surface conditions'19985,490,728'Non-contact optical techniques for measuring surface conditions'19965,364,186'Apparatus and method for monitoring a temperature using a thermally fused composite ceramic blackbody temperature probe'19945,318,362'Non-contact techniques for measuring temperature of radiation-heated objects'19945,310,260'Non-contact optical techniques for measuring surface conditions'19945,183,338'Temperature measurement with combined photo-luminescent and black body sensing techniques'19935,166,080'Techniques for measuring the thickness of a film formed on a substrate'19925,154,512'Non-contact techniques for measuring temperature or radiation-heated objects'19925,112,137'Temperature measurement with combined photo-luminescent and black body sensing techniques'19924,145,479'Heat resistant curable surface coating composition comprising the reaction product of an unsaturated polyaryloxyphosphazene and an unsaturated aryloxycyclotriphosphazene'1979

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

1979Based in Landisville, PA, US· patent location history
1992–1998Patents assigned to LUXTRON CORP (9)· patent assignee history
1992–2020Based in Portland, OR, US· patent location history
2001–2020Patents assigned to APPLIED MATERIALS INC (62)· patent assignee history
2012–2017Patents assigned to ADAMS BRUCE E (19)· patent assignee history
2012–2017Patents assigned to HUNTER AARON MUIR (10)· patent assignee history
2012–2014Patents assigned to JENNINGS DEAN (9)· patent assignee history

Inventor activity

Assignee and location history derived from the patent record.

Assignees
AssigneePatentsSpan
APPLIED MATERIALS INC622001–2020
ADAMS BRUCE Eself192012–2017
HUNTER AARON MUIR102012–2017
JENNINGS DEAN92012–2014
LUXTRON CORP91992–1998
Locations
LocationPatentsSpan
Portland, OR, US711992–2020
Landisville, Pennsylvania, US11979