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Inventor

Haruko Ohno

Inventor
Tokyo, JP

Overview

3→
Patents
2003–2004
Patent span
Electricity
Primary field (CPC H)

Patents· 3 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

H10Pprimary
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1050%
Y10STechnical subjects covered by former uspc cross-reference art collections [xracs] and digests33%
C23FNon-mechanical removal of metallic material from surface17%
PatentTitleYear
6,776,919'Method and apparatus for etching ruthenium films'20046,745,784'Method of and apparatus for cleaning substrate'20046,558,478'Method of and apparatus for cleaning substrate'2003

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

2003–2004Patents assigned to EBARA CORP (3)· patent assignee history
2003–2004Based in Tokyo, JP· patent location history

Inventor activity

Assignee and location history derived from the patent record.

Assignees
AssigneePatentsSpan
EBARA CORP32003–2004
Locations
LocationPatentsSpan
Tokyo, JP32003–2004