Inventor
Melisa J. Buie
Inventor
San Jose, CA, US
Overview
Patents· 6 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
G03Fprimary
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices38%
C23FNon-mechanical removal of metallic material from surface23%
H01JElectric discharge tubes or discharge lamps23%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1015%
PatentTitleYear
7,371,485'Multi-step process for etching photomasks'20087,250,309'Integrated phase angle and optical critical dimension measurement metrology for feed forward and feedback process control'20077,115,523'Method and apparatus for etching photomasks'20067,018,934'Methods and apparatus for etching metal layers on substrates'20066,960,413'Multi-step process for etching photomasks'20056,649,075'Method and apparatus for measuring etch uniformity of a semiconductor wafer'2003Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
2003–2008Patents assigned to APPLIED MATERIALS INC (6)· patent assignee history
2003Based in Sunnyvale, CA, US· patent location history
2005–2008Based in San Jose, CA, US· patent location history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| APPLIED MATERIALS INC | 6 | 2003–2008 |
Locations
| Location | Patents | Span |
|---|---|---|
| San Jose, California, US | 5 | 2005–2008 |
| Sunnyvale, California, US | 1 | 2003 |