Inventor

David Trussell

Inventor

Fremont, CA, US

Overview

17→

Patents

1999–2021

Patent span

Electricity

Primary field (CPC H)

Patents· 17 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

H01Jprimary

H01JElectric discharge tubes or discharge lamps22%

H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1022%

C23CCoating metallic material16%

H01LSemiconductor devices16%

Y10STechnical subjects covered by former uspc cross-reference art collections [xracs] and digests8%

G01JMeasurement of intensity, velocity, spectral content, polarisation, phase or pulse characteristics of infrared, visible or ultraviolet light4%

H05HPlasma technique4%

B08BCleaning in general2%

G05BControl or regulating systems in general2%

H01QAntennas, i.e. radio aerials2%

PatentTitleYear

11,112,773Systems for removing and replacing consumable parts from a semiconductor process module in situ2021 10,804,079Active showerhead2020 10,790,174Wafer transport assembly with integrated buffers2020 10,403,476Active showerhead2019 10,304,707Load lock interface and integrated post-processing module2019 10,014,196Wafer transport assembly with integrated buffers2018 9,929,028'Service tunnel for use on capital equipment in semiconductor manufacturing and research fabs'2018 9,502,275'Service tunnel for use on capital equipment in semiconductor manufacturing and research fabs'2016 8,573,153'Multi-part electrode for a semiconductor processing plasma reactor and method of replacing a portion of a multi-part electrode'2013 8,500,952'Plasma confinement rings having reduced polymer deposition characteristics'2013 8,262,922'Plasma confinement rings having reduced polymer deposition characteristics'2012 7,861,667'Multi-part electrode for a semiconductor processing plasma reactor and method of replacing a portion of a multi-part electrode'2011 7,430,986'Plasma confinement ring assemblies having reduced polymer deposition characteristics'2008 7,169,256'Plasma processor with electrode responsive to multiple RF frequencies'2007 RE038097'Chemical vapor deposition system with a plasma chamber having separate process gas and cleaning gas injection ports'2003 5,988,187'Chemical vapor deposition system with a plasma chamber having separate process gas and cleaning gas injection ports'1999 5,911,833'Method of in-situ cleaning of a chuck within a plasma chamber'1999

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

1999–2021Patents assigned to LAM RES CORP (17)· patent assignee history

1999–2021Based in Fremont, CA, US· patent location history

2012–2013Patents assigned to TRUSSELL DAVID (3)· patent assignee history

2012–2013Patents assigned to DHINDSA RAJINDER (2)· patent assignee history

2012–2013Patents assigned to KOZAKEVICH FELIX (2)· patent assignee history

2012–2013Patents assigned to ROGERS JAMES H (2)· patent assignee history

Inventor activity

Assignee and location history derived from the patent record.

Assignees

Assignee	Patents	Span
LAM RES CORP	17	1999–2021
TRUSSELL DAVIDself	3	2012–2013
DHINDSA RAJINDER	2	2012–2013
KOZAKEVICH FELIX	2	2012–2013
ROGERS JAMES H	2	2012–2013

Locations

Location	Patents	Span
Fremont, California, US	17	1999–2021