Inventor

Seiichi Uchida

Inventor
Osaka, JP

Overview

49→
Patents
1980–2021
Patent span
Physics
Primary field (CPC G)

Patents· 49 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

G02Fprimary
G02FOptical devices or arrangements for the control of light by modification of the optical properties of the media of the elements involved therein17%
H10DInorganic electric semiconductor devices14%
H01LSemiconductor devices13%
G09GArrangements or circuits for control of indicating devices using static means to present variable information7%
C07DHeterocyclic compounds4%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h104%
Y10STechnical subjects covered by former uspc cross-reference art collections [xracs] and digests4%
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices4%
A61PSpecific therapeutic activity of chemical compounds or medicinal preparations3%
G06FElectric digital data processing3%
PatentTitleYear
11,081,084Electronic apparatus, luminance control method, and storage medium202110,768,496Thin film transistor substrate and display panel202010,698,283Liquid crystal display device202010,386,670Display device201910,386,684Semiconductor device, display apparatus, and method of manufacturing semiconductor device201910,243,083Semiconductor device and method for manufacturing semiconductor device201910,197,874Liquid crystal display device201910,082,715Conductive element and liquid crystal display element201810,036,909Display device20189,933,676Liquid crystal panel and active matrix substrate used therefor20189,613,990'Semiconductor device and method for manufacturing same'20179,608,008'Active matrix substrate and method for producing same'20179,581,843'Liquid crystal display device and method for driving the same'20179,570,469'Active-matrix substrate and liquid-crystal display device'20179,520,097'Display device with compensating backlight drive circuit and method for driving same'20169,520,476'Semiconductor device and method for producing same'20169,379,250'Semiconductor device and method for producing same'20169,373,648'Semiconductor device and method of manufacture thereof'20169,341,904'Liquid-crystal display apparatus with large viewing angle and high optical transmittance'20169,336,736'Liquid crystal display device and method for driving auxiliary capacitance lines'20169,337,213'Semiconductor device and method for manufacturing same'20169,310,911'Display device'20169,276,126'Semiconductor device and method for producing same'20169,276,127'Semiconductor device and method for producing same'20169,261,746'Liquid crystal display device and manufacturing method of liquid crystal display device'20169,229,284'Liquid crystal display device'20169,214,533'Semiconductor device having transparent electrodes'20159,035,299'Semiconductor device and method for producing same'20158,704,819'Display device and method for driving same'20148,698,726'Display device and method for powering same'20148,681,279'Optical sensor, semiconductor device, and liquid crystal panel'20148,188,577'Production method of semiconductor device, semiconductor device, and exposure apparatus'20127,652,155'Diamine derivative, production process therefor and antioxidant'20107,553,837'Phenylazole compounds production process and antioxidants'20096,482,948'Thienopyrimidine compounds and salts thereof and process for the preparation of the same'20026,375,793'Method and tower for removing residual monomers'20026,342,516'Phenylazole compounds, process for producing the same and drugs for hyperlipemia'20025,965,743'N-substituted imidazol derivative'19995,856,480'Optically active compound'19995,804,039'Method for removing residual monomers'19984,738,886'Resin printing plate and preparation thereof'19884,700,007'Process for preparing macrocyclic ketones'19874,626,097'Process for preparing printing plates'19864,618,550'Resin printing plate and preparation thereof'19864,600,667'Preparation of printing plate by pattern exposing both sides of curable liquid resin'19864,294,803'Apparatus for preventing coking in fluidized bed reactor for cracking heavy hydrocarbon oil'19814,275,158'Manufacture of fatty acids having straight and long carbon chains using a microorganism'19814,220,518'Method for preventing coking in fluidized bed reactor for cracking heavy hydrocarbon oil'19804,220,720'Manufacture of fatty acids having straight and long carbon chains using a microorganism'1980

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

1980–1981Based in Urawa, JP· patent location history
1986Based in Moriguchi, JP· patent location history
1988–2018Based in Osaka, JP· patent location history
1999–2010Patents assigned to NIPPON SODA CO (6)· patent assignee history
2009–2010Based in Odawara, JP· patent location history
2012–2020Patents assigned to SHARP KK (31)· patent assignee history
2012–2016Patents assigned to UCHIDA SEIICHI (9)· patent assignee history
2014–2016Patents assigned to KANEKO SEIJI (5)· patent assignee history
2014–2016Patents assigned to MORI SHIGEYASU (5)· patent assignee history
2018–2020Based in Sakai, JP· patent location history

Inventor activity

Assignee and location history derived from the patent record.

Assignees
AssigneePatentsSpan
SHARP KK312012–2020
UCHIDA SEIICHIself92012–2016
NIPPON SODA CO61999–2010
KANEKO SEIJI52014–2016
MORI SHIGEYASU52014–2016
Locations
LocationPatentsSpan
Osaka, JP251988–2018
Sakai, JP72018–2020
Moriguchi, JP31986
Urawa, JP31980–1981
Odawara, JP22009–2010