Inventor
Chidane Ouchi
Inventor
Utsunomiya, JP
Overview
Patents· 24 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
G03Fprimary
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices20%
G01JMeasurement of intensity, velocity, spectral content, polarisation, phase or pulse characteristics of infrared, visible or ultraviolet light16%
A61BDiagnosis14%
G01NInvestigating or analysing materials by determining their chemical or physical properties14%
G21KHandling of particles or ionising radiation not otherwise provided for13%
G01BMeasuring length, thickness or similar linear dimensions11%
G06TImage data processing or generation, in general5%
G01MTesting static or dynamic balance of machines or structures4%
G02BOptical elements, systems or apparatus2%
H01SDevices using the process of light amplification by stimulated emission of radiation [laser] to amplify or generate light2%
PatentTitleYear
9,107,637'X-ray imaging apparatus and wavefront measuring apparatus'20159,066,704'X-ray imaging apparatus'20159,063,055'X-ray imaging apparatus'20159,046,466'X-ray imaging apparatus'20159,043,182'Absolute position measurement apparatus and method'20158,995,613'X-ray imaging apparatus'20158,559,594'Imaging apparatus and imaging method'20138,537,966'X-ray imaging apparatus, X-ray imaging method, and X-ray imaging program'20138,520,217'Talbot interferometer, its adjustment method, and measurement method'20138,351,050'Wavefront-aberration-measuring device and exposure apparatus'20138,340,243'X-ray imaging apparatus, X-ray imaging method, and X-ray imaging program'20128,077,391'Wavefront aberration measuring method, mask, wavefront aberration measuring device, exposure apparatus, and device manufacturing method'20118,009,797'X-ray imaging apparatus, X-ray imaging method, and X-ray imaging program'20118,004,691'Measuring apparatus, exposure apparatus and method, and device manufacturing method'20117,952,726'Measurement apparatus, exposure apparatus having the same, and device manufacturing method'20117,253,907'Measuring method and apparatus using shearing interferometry, exposure method and apparatus using the same, and device manufacturing method'20077,106,452'Measuring device and measuring method'20066,961,132'Interference system and semiconductor exposure apparatus having the same'20056,853,442'Projection exposure apparatus and device manufacturing method that change a resonator length of a continuous emission excimer laser'20056,774,982'Exposure apparatus and device manufacturing method using the same'20046,721,056'Surface shape measuring apparatus and method'20046,661,522'Interference system and semiconductor exposure apparatus having the same'20036,322,220'Exposure apparatus and device manufacturing method using the same'20015,067,811'Illuminance distribution measuring system'1991Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
1991–2015Patents assigned to CANON KK (24)· patent assignee history
1991Based in Kawasaki, JP· patent location history
2001–2015Based in Utsunomiya, JP· patent location history
2006–2007Based in Tochigi, JP· patent location history
2011–2015Patents assigned to OUCHI CHIDANE (11)· patent assignee history
2011–2013Patents assigned to KATO SEIMA (2)· patent assignee history
2012–2015Patents assigned to DEN TORU (2)· patent assignee history
2013–2015Patents assigned to KOHARA NAOKI (2)· patent assignee history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| CANON KK | 24 | 1991–2015 |
| OUCHI CHIDANEself | 11 | 2011–2015 |
| DEN TORU | 2 | 2012–2015 |
| KATO SEIMA | 2 | 2011–2013 |
| KOHARA NAOKI | 2 | 2013–2015 |
Locations
| Location | Patents | Span |
|---|---|---|
| Utsunomiya, JP | 21 | 2001–2015 |
| Tochigi, JP | 2 | 2006–2007 |
| Kawasaki, JP | 1 | 1991 |