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Inventor

Shiwen Li

Inventor
Liuyang, CN

Overview

6→
Patents
2001–2018
Patent span
Physics
Primary field (CPC G)

Patents· 6 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

G03Fprimary
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices27%
LOC1427%
G02BOptical elements, systems or apparatus18%
G03BApparatus or arrangements for taking photographs or for projecting or viewing them9%
H02KDynamo-electric machines9%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h109%
PatentTitleYear
D0820227Set-top box2018D0816050Set-top box2018D0814434Set-top box20186,639,732'Projection exposure apparatus and method'20036,417,914'Stage device and exposure apparatus'20026,195,213'Projection exposure apparatus and method'2001

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

2001–2003Patents assigned to NIKON CORP (3)· patent assignee history
2001–2003Based in Kawasaki, JP· patent location history
2002Based in Kumagaya, JP· patent location history
2018Patents assigned to LI SHIWEN (3)· patent assignee history
2018Based in Liuyang, CN· patent location history

Inventor activity

Assignee and location history derived from the patent record.

Assignees
AssigneePatentsSpan
LI SHIWENself32018
NIKON CORP32001–2003
Locations
LocationPatentsSpan
Liuyang, CN32018
Kawasaki, JP22001–2003
Kumagaya, JP12002