Inventor
JASON K. STOWERS
Inventor
US
Overview
Patents· 11 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
G03Fprimary
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices52%
Y10TTechnical subjects covered by former us classification24%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1014%
H01LSemiconductor devices5%
H10WGeneric packages, interconnections, connectors or other constructional details of devices covered by class h105%
PatentTitleYear
12,566,377Multiple patterning with organometallic photopatternable layers with intermediate freeze steps202612,554,195Radiation based patterning methods202612,498,641Process environment for inorganic resist patterning202512,360,454Stabilized interfaces of inorganic radiation patterning compositions on substrates202511,988,961Radiation based patterning methods202411,947,262Process environment for inorganic resist patterning202411,886,116Multiple patterning with organometallic photopatternable layers with intermediate freeze steps202411,693,312Radiation based patterning methods202311,599,022Radiation based patterning methods202311,392,031Radiation based patterning methods202211,347,145Pre-patterned lithography templates2022Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
2022–2026Patents assigned to INPRIA CORP (11)· patent assignee history
2022–2026Based in US· patent location history
2025Patents assigned to TOKYO ELECTRON LTD (1)· patent assignee history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| INPRIA CORP | 11 | 2022–2026 |
| TOKYO ELECTRON LTD | 1 | 2025 |
Locations
| Location | Patents | Span |
|---|---|---|
| US | 11 | 2022–2026 |