LexDanaLexDanabeta
Inventor

Hiroshi Tsukada

Inventor
Kanagawa, JP

Overview

11→
Patents
1988–2016
Patent span
Physics
Primary field (CPC G)

Patents· 11 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

G01Nprimary
G01NInvestigating or analysing materials by determining their chemical or physical properties16%
G01BMeasuring length, thickness or similar linear dimensions12%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1012%
G02FOptical devices or arrangements for the control of light by modification of the optical properties of the media of the elements involved therein8%
G06TImage data processing or generation, in general8%
B25BTools or bench devices not otherwise provided for, for fastening, connecting, disengaging, or holding4%
G01RMeasuring electric variables4%
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices4%
G05DSystems for controlling or regulating non-electric variables4%
G06FElectric digital data processing4%
PatentTitleYear
9,406,117'Inspection system and method for inspecting line width and/or positional errors of a pattern'20169,159,892'LED light source device and manufacturing method for the same'20159,036,896'Inspection system and method for inspecting line width and/or positional errors of a pattern'20158,761,518'Pattern inspection apparatus'20148,054,437'Large substrate, method of manufacturing liquid crystal device from the same, and liquid crystal device obtained'20117,392,252'System, apparatus, and method for processing information, and computer program, and recording medium'20087,224,460'Mapping-measurement apparatus'20076,853,437'Liquid crystal display and method for manufacturing the same'20056,239,602'Temperature managing apparatus for multi-stage container'20016,205,652'Vacuum coupling system'20014,782,031'Method of making GaAs MOSFET with low source resistance yet having satisfactory leakage current by ion-implantation'1988

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

2001Based in Nishikamo-gun, JP· patent location history
2008Based in Sapporo, JP· patent location history
2011–2015Patents assigned to CITIZEN HOLDINGS CO LTD (2)· patent assignee history
2011Based in Sayama, JP· patent location history
2014–2015Patents assigned to TSUKADA HIROSHI (3)· patent assignee history
2014–2015Patents assigned to FUJIWARA TAKESHI (2)· patent assignee history
2014–2015Patents assigned to INOUE HIROMU (2)· patent assignee history
2014–2016Based in Kanagawa, JP· patent location history
2015–2016Patents assigned to NUFLARE TECHNOLOGY INC (2)· patent assignee history
2015Based in Saitama, JP· patent location history

Inventor activity

Assignee and location history derived from the patent record.

Assignees
AssigneePatentsSpan
TSUKADA HIROSHIself32014–2015
CITIZEN HOLDINGS CO LTD22011–2015
FUJIWARA TAKESHI22014–2015
INOUE HIROMU22014–2015
NUFLARE TECHNOLOGY INC22015–2016
Locations
LocationPatentsSpan
Kanagawa, JP32014–2016
Nishikamo-gun, JP22001
Saitama, JP12015
Sayama, JP12011
Sapporo, JP12008