Inventor

Keitaro Sakamoto

Inventor

Otsu, JP

Overview

2→

Patents

2013–2016

Patent span

Electricity

Primary field (CPC H)

Patents· 2 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

C23Cprimary

C23CCoating metallic material20%

H01JElectric discharge tubes or discharge lamps20%

H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1020%

H01LSemiconductor devices10%

H10FInorganic semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation10%

Y02EReduction of greenhouse gas [ghg] emissions, related to energy generation, transmission or distribution10%

Y02PClimate change mitigation technologies in the production or processing of goods10%

PatentTitleYear

9,243,327'Plasma CVD device and method of manufacturing silicon thin film'2016 8,431,996'Plasma processing apparatus and method of producing amorphous silicon thin film using same'2013

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

2013–2016Patents assigned to KOMORI TSUNENORI (2)· patent assignee history

2013–2016Patents assigned to SAKAMOTO KEITARO (2)· patent assignee history

2013–2016Patents assigned to TORAY INDUSTRIES (2)· patent assignee history

2013Patents assigned to NOMURA FUMIYASU (1)· patent assignee history

2013–2016Based in Otsu, JP· patent location history

2016Patents assigned to AMIOKA TAKAO (1)· patent assignee history

Inventor activity

Assignee and location history derived from the patent record.

Assignees

Assignee	Patents	Span
KOMORI TSUNENORI	2	2013–2016
SAKAMOTO KEITAROself	2	2013–2016
TORAY INDUSTRIES	2	2013–2016
AMIOKA TAKAO	1	2016
NOMURA FUMIYASU	1	2013

Locations

Location	Patents	Span
Otsu, JP	2	2013–2016