Inventor
MATTHEW R. MACDONALD
Inventor
US
Overview
Patents· 17 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
C23Cprimary
C23CCoating metallic material26%
C07FAcyclic, carbocyclic or heterocyclic compounds containing elements other than carbon, hydrogen, halogen, oxygen, nitrogen, sulfur, selenium or tellurium23%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1014%
H01LSemiconductor devices9%
C09DCoating compositions, e.g. paints, varnishes or lacquers8%
C08GMacromolecular compounds obtained otherwise than by reactions only involving unsaturated carbon-to-carbon bonds5%
C08LCompositions of macromolecular compounds5%
C01BNon-metallic elements3%
C01PIndexing scheme relating to structural and physical aspects of solid inorganic compounds3%
H10BElectronic memory devices3%
PatentTitleYear
12,584,212Compositions and methods using same for germanium seed layer202612,534,579Organoamino-functionalized linear and cyclic oligosiloxanes for deposition of silicon-containing films202612,516,073Organoamino-functionalized cyclic oligosiloxanes for deposition of silicon-containing films202612,480,206Organoaminodisilazanes for high temperature atomic layer deposition of silicon oxide thin films202512,230,496Organoaminosilane precursors and methods for depositing films comprising same202512,057,310Functionalized cyclosilazanes as precursors for high growth rate silicon-containing films202412,018,040Organoamino-functionalized cyclic oligosiloxanes for deposition of silicon-containing films202411,952,465Organoamino-functionalized linear and cyclic oligosiloxanes for deposition of silicon-containing films202411,912,730Organoamino-functionalized cyclic oligosiloxanes for deposition of silicon-containing films202411,702,743Trisilylamine derivatives as precursors for high growth rate silicon-containing films202311,649,547Deposition of carbon doped silicon oxide202311,631,580Formulation for deposition of silicon doped hafnium oxide as ferroelectric materials202311,591,692Organoamino-polysiloxanes for deposition of silicon-containing films202311,584,854Compositions and methods for the deposition of silicon oxide films202311,193,206Formulation for deposition of silicon doped hafnium oxide as ferroelectric materials202111,177,127Functionalized cyclosilazanes as precursors for high growth rate silicon-containing films202111,139,162Organoaminosilane precursors and methods for depositing films comprising same2021Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
2021–2026Patents assigned to VERSUM MAT US LLC (17)· patent assignee history
2021–2026Based in US· patent location history
2025Patents assigned to VERSON MAT US LLC (1)· patent assignee history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| VERSUM MAT US LLC | 17 | 2021–2026 |
| VERSON MAT US LLC | 1 | 2025 |
Locations
| Location | Patents | Span |
|---|---|---|
| US | 17 | 2021–2026 |