Inventor

Yoshio Honma

Inventor

Kokubunji, JP

Overview

1976–2014

Patent span

Chemistry

Primary field (CPC C)

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

H10Pprimary

H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1026%

C09GPolishing compositions21%

C23FNon-mechanical removal of metallic material from surface21%

C09KMaterials for miscellaneous applications, not provided for elsewhere13%

H10WGeneric packages, interconnections, connectors or other constructional details of devices covered by class h105%

C01FCompounds of the metals beryllium, magnesium, aluminium, calcium, strontium, barium, radium, thorium, or of the rare-earth metals3%

C01PIndexing scheme relating to structural and physical aspects of solid inorganic compounds3%

F28GCleaning of internal or external surfaces of heat-exchange or heat-transfer conduits, e.g. water tubes or boilers3%

H01LSemiconductor devices3%

H04LTransmission of digital information, e.g. telegraphic communication3%

PatentTitleYear

Assembled from patent assignee/location history and declaration credentials.

1976Based in Yokosuka, JP· patent location history

1988–2014Patents assigned to HITACHI LTD (8)· patent assignee history

1988Based in Nishitama-gun, JP· patent location history

1999–2002Based in Tokyo, JP· patent location history

2002–2014Patents assigned to HITACHI CHEMICAL CO LTD (7)· patent assignee history

2005–2014Based in Kokubunji, JP· patent location history

2012–2014Patents assigned to HONMA YOSHIO (3)· patent assignee history

2012–2014Patents assigned to HOSHINO TETSUYA (3)· patent assignee history

2012–2014Patents assigned to KAMIGATA YASUO (3)· patent assignee history

Assignee and location history derived from the patent record.

Assignees

Locations