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Inventor

Jauder Jeng

Inventor
Taichung, TW

Overview

4→
Patents
2001–2015
Patent span
Chemistry
Primary field (CPC C)

Patents· 4 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

G03Fprimary
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices33%
C08LCompositions of macromolecular compounds22%
C08GMacromolecular compounds obtained otherwise than by reactions only involving unsaturated carbon-to-carbon bonds11%
C08KUse of inorganic or non-macromolecular organic substances as compounding ingredients11%
C09JAdhesives11%
Y10STechnical subjects covered by former uspc cross-reference art collections [xracs] and digests11%
PatentTitleYear
9,170,490'Photosensitive composition and photoresist'20159,081,275'Photosensitive composition and photoresist'20158,193,258'Sealant composition'20126,306,557'Process for preparing water dispersible negative-type photosensitive compositions'2001

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

2001Patents assigned to IND TECHNOLOGY RES FOUNDATION (1)· patent assignee history
2001–2015Based in Taichung, TW· patent location history
2012–2015Patents assigned to IND TECH RES INST (3)· patent assignee history
2012Patents assigned to CHEN MAN-LIN (1)· patent assignee history
2012Patents assigned to JENG JAUDER (1)· patent assignee history
2012Patents assigned to LIU PEI-CHING (1)· patent assignee history

Inventor activity

Assignee and location history derived from the patent record.

Assignees
AssigneePatentsSpan
IND TECH RES INST32012–2015
CHEN MAN-LIN12012
IND TECHNOLOGY RES FOUNDATION12001
JENG JAUDERself12012
LIU PEI-CHING12012
Locations
LocationPatentsSpan
Taichung, TW42001–2015