Inventor
Rafael Reif
Inventor
Newton, MA, US
Overview
Patents· 7 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
H10Dprimary
H10DInorganic electric semiconductor devices23%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1023%
H10WGeneric packages, interconnections, connectors or other constructional details of devices covered by class h1023%
Y10STechnical subjects covered by former uspc cross-reference art collections [xracs] and digests23%
G06FElectric digital data processing8%
PatentTitleYear
7,480,879'Substrate noise tool'20097,307,003'Method of forming a multi-layer semiconductor structure incorporating a processing handle member'20077,067,909'Multi-layer integrated semiconductor structure having an electrical shielding portion'20067,064,055'Method of forming a multi-layer semiconductor structure having a seamless bonding interface'20066,638,797'High performance poly-SiGe thin film transistor and a method of fabricating such a thin film transistor'20036,444,509'High performance poly-si1xgex thin film transistor and a method of fabricating such a thin film transistor'20025,828,084'High performance poly-SiGe thin film transistor'1998Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
1998–2009Patents assigned to MASSACHUSETTS INST TECHNOLOGY (7)· patent assignee history
1998–2003Patents assigned to SONY CORP (3)· patent assignee history
1998–2009Based in Newton, MA, US· patent location history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| MASSACHUSETTS INST TECHNOLOGY | 7 | 1998–2009 |
| SONY CORP | 3 | 1998–2003 |
Locations
| Location | Patents | Span |
|---|---|---|
| Newton, Massachusetts, US | 7 | 1998–2009 |