Inventor
Chung-Shih Pan
Inventor
Palo Alto, CA, US
Overview
Patents· 20 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
H01Jprimary
H01JElectric discharge tubes or discharge lamps44%
G01NInvestigating or analysing materials by determining their chemical or physical properties22%
H05FStatic electricity17%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h107%
G01RMeasuring electric variables2%
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices2%
G06TImage data processing or generation, in general2%
H01HElectric switches2%
PatentTitleYear
11,120,956Keyboard device202110,775,325Method and system for inspecting an EUV mask202010,088,438Method and system for inspecting an EUV mask201810,054,556Structure electron beam inspection system for inspecting extreme ultraviolet mask and structure for discharging extreme ultraviolet mask20189,859,089'Method and system for inspecting and grounding an EUV mask'20189,572,237'Structure electron beam inspection system for inspecting extreme ultraviolet mask and structure for discharging extreme ultraviolet mask'20179,485,846'Method and system for inspecting an EUV mask'20169,460,887'Discharging method for charged particle beam imaging'20169,164,399'Reticle operation system'20159,113,538'Structure electron beam inspection system for inspecting extreme ultraviolet mask and structure for discharging extreme ultraviolet mask'20158,604,428'Method of controlling particle absorption on a wafer sample being inspected by a charged particle beam imaging system'20138,575,573'Structure for discharging extreme ultraviolet mask'20138,519,333'Charged particle system for reticle/wafer defects inspection and review'20138,110,818'Method of controlling particle absorption on a wafer sample being inspected by a charged particle beam imaging system'20128,094,924'E-beam defect review system'20128,031,344'Z-stage configuration and application thereof'20117,868,303'Method and handling apparatus for placing patterning device on support member for charged particle beam imaging'20117,838,848'Patterning device holding apparatus and application thereof'20106,791,095'Method and system of using a scanning electron microscope in semiconductor wafer inspection with Z-stage focus'20045,502,306'Electron beam inspection system and method'1996Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
1996–2018Based in Palo Alto, CA, US· patent location history
2010–2018Patents assigned to HERMES MICROVISION INC (16)· patent assignee history
2010Based in Los Alto, CA, US· patent location history
2012–2016Patents assigned to PAN CHUNG-SHIH (6)· patent assignee history
2012–2016Patents assigned to WANG YOU-JIN (4)· patent assignee history
2012–2013Patents assigned to CHEN ZHONGWEI (2)· patent assignee history
2013Patents assigned to KUAN CHIYAN (2)· patent assignee history
2016–2020Based in San Jose, CA, US· patent location history
2021Based in Taipei, TW· patent location history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| HERMES MICROVISION INC | 16 | 2010–2018 |
| PAN CHUNG-SHIHself | 6 | 2012–2016 |
| WANG YOU-JIN | 4 | 2012–2016 |
| CHEN ZHONGWEI | 2 | 2012–2013 |
| KUAN CHIYAN | 2 | 2013 |
Locations
| Location | Patents | Span |
|---|---|---|
| Palo Alto, California, US | 15 | 1996–2018 |
| San Jose, California, US | 3 | 2016–2020 |
| Taipei, TW | 1 | 2021 |
| Los Alto, California, US | 1 | 2010 |