Inventor
Randall Culver
Inventor
Boise, ID, US
Overview
Patents· 1 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
H10Pprimary
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h10100%
PatentTitleYear
7,329,618'Ion implanting methods'2008Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
2008Patents assigned to MICRON TECHNOLOGY INC (1)· patent assignee history
2008Based in Boise, ID, US· patent location history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| MICRON TECHNOLOGY INC | 1 | 2008 |
Locations
| Location | Patents | Span |
|---|---|---|
| Boise, ID, US | 1 | 2008 |