Inventor
Shigeru Wakiyama
Inventor
Chiba, JP
Overview
Patents· 19 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
G01Qprimary
G01QScanning-probe techniques or apparatus31%
B82YSpecific uses or applications of nanostructures13%
G01NInvestigating or analysing materials by determining their chemical or physical properties13%
Y10STechnical subjects covered by former uspc cross-reference art collections [xracs] and digests13%
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices9%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h109%
H01JElectric discharge tubes or discharge lamps4%
H10WGeneric packages, interconnections, connectors or other constructional details of devices covered by class h104%
Y10TTechnical subjects covered by former us classification2%
PatentTitleYear
9,766,267'Actuator position calculation device, actuator position calculation method, and actuator position calculation program'20178,495,759'Probe aligning method for probe microscope and probe microscope operated by the same'20137,945,964'Apparatus structure and scanning probe microscope including apparatus structure'20117,378,654'Processing probe'20087,373,806'Scanning probe microscope and scanning method'20087,278,299'Method of processing vertical cross-section using atomic force microscope'20077,259,372'Processing method using probe of scanning probe microscope'20077,232,995'Method of removing particle of photomask using atomic force microscope'20076,388,249'Surface analyzing apparatus'20026,355,495'Method and apparatus for analyzing minute foreign substance, and process for semiconductor elements or liquid crystal elements by use thereof'20026,259,093'Surface analyzing apparatus'20016,255,127'Analyzing method and apparatus for minute foreign substances, and manufacturing methods for manufacturing semiconductor device and liquid crystal display device using the same'20016,184,519'Surface analyzing apparatus with anti-vibration table'20016,124,142'Method for analyzing minute foreign substance elements'20005,877,035'Analyzing method and apparatus for minute foreign substances, and manufacturing methods for manufacturing semiconductor device and liquid crystal display device using the same'19995,453,616'Probe microscope having error correction piezoelectric scanner'19955,423,514'Alignment assembly for aligning a spring element with a laser beam in a probe microscope'19954,921,346'Tunnel current detecting photo-acoustic spectrometer'19904,866,271'Relative displacement control apparatus'1989Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
1989–2002Patents assigned to SEIKO INSTR INC (11)· patent assignee history
1989–1990Patents assigned to AGENCY IND SCIENCE TECHN (2)· patent assignee history
1989–2017Based in Tokyo, JP· patent location history
1995–2013Based in Chiba, JP· patent location history
1999–2002Patents assigned to MITSUBISHI ELECTRIC CORP (7)· patent assignee history
2007–2013Patents assigned to SII NANOTECHNOLOGY INC (7)· patent assignee history
2017Patents assigned to HITACHI HIGH-TECH SCIENCE CORP (1)· patent assignee history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| SEIKO INSTR INC | 11 | 1989–2002 |
| MITSUBISHI ELECTRIC CORP | 7 | 1999–2002 |
| SII NANOTECHNOLOGY INC | 7 | 2007–2013 |
| AGENCY IND SCIENCE TECHN | 2 | 1989–1990 |
| HITACHI HIGH-TECH SCIENCE CORP | 1 | 2017 |
Locations
| Location | Patents | Span |
|---|---|---|
| Chiba, JP | 15 | 1995–2013 |
| Tokyo, JP | 4 | 1989–2017 |