LexDanaLexDanabeta
Inventor

Daisuke Kori

Inventor
Jyoetsu, JP

Overview

65→
Patents
2010–2021
Patent span
Electricity
Primary field (CPC H)

Patents· 65 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

G03Fprimary
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices18%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1014%
H01LSemiconductor devices12%
C08GMacromolecular compounds obtained otherwise than by reactions only involving unsaturated carbon-to-carbon bonds10%
H02KDynamo-electric machines7%
C09DCoating compositions, e.g. paints, varnishes or lacquers7%
C07CAcyclic or carbocyclic compounds6%
C07DHeterocyclic compounds3%
C08KUse of inorganic or non-macromolecular organic substances as compounding ingredients3%
C08LCompositions of macromolecular compounds3%
PatentTitleYear
11,042,090Composition for forming organic film202111,018,015Composition for forming organic film, substrate for manufacturing semiconductor device, method for forming organic film, and patterning process202110,998,197Polymer and composition for forming organic film, substrate for manufacturing semiconductor apparatus, method for forming organic film, and patterning process202110,811,247Method of cleaning and drying semiconductor substrate202010,620,537Resist underlayer film composition, patterning process, method for forming resist underlayer film, and compound for resist underlayer film composition202010,615,045Composition for forming organic film, patterning process, and resin for forming organic film202010,444,628Compound for forming organic film, composition for forming organic film, method for forming organic film, and patterning process201910,429,739Compound for forming organic film, composition for forming organic film, method for forming organic film, and patterning process201910,416,563Resist underlayer film composition, patterning process, and method for forming resist underlayer film201910,241,412Resist underlayer film composition, patterning process, and method for forming resist underlayer film201910,243,430Rotating electrical machine with rotor and stator, with a stator core including packet cores201910,228,621Underlayer film-forming composition and pattern forming process201910,177,621Rotating electric machine or wind power generation system201910,156,788Resist underlayer film composition, patterning process, and compound201810,075,112Field winding type synchronous machine201810,047,244Method for producing a composition for forming an organic film201810,007,183Compound for forming organic film, and organic film composition using the same, process for forming organic film, and patterning process20189,984,878Resist under layer film composition and patterning process20189,977,330Compound for forming organic film, and organic film composition using the same, process for forming organic film, and patterning process20189,899,218'Resist under layer film composition and patterning process'20189,893,593'Rotating electric machine having a cooling frame with a plurality of coolants'20189,857,686'Composition for forming resist underlayer film and patterning process'20189,798,242'Rinse solution for pattern formation and pattern forming process'20179,785,049'Method for forming multi-layer film and patterning process'20179,728,420'Organic film composition, process for forming organic film, patterning process, and compound'20179,632,416'Rinse solution for pattern formation and pattern forming process'20179,624,356'Ultraviolet absorber, composition for forming a resist under layer film, and patterning process'20179,620,363'Underlayer film-forming composition and pattern forming process'20179,524,863'Method for cleaning and drying semiconductor substrate'20169,484,793'Electrical rotating machine system or wind turbine system'20169,312,127'Method for producing semiconductor apparatus substrate'20169,276,506'Field winding type synchronous motor'20169,261,788'Compound for forming organic film, and organic film composition using the same, process for forming organic film, and patterning process'20169,230,827'Method for forming a resist under layer film and patterning process'20169,225,213'Electrical rotating machine'20159,203,277'Permanent magnet pump motor'20159,146,468'Resist underlayer film composition and patterning process using the same'20159,136,121'Underlayer film-forming composition and pattern forming process'20159,136,122'Underlayer film-forming composition and pattern forming process'20159,054,568'Permanent magnet rotating electric machine'20159,046,764'Resist underlayer film composition, method for producing polymer for resist underlayer film, and patterning process using the resist underlayer film composition'20159,045,587'Naphthalene derivative, resist bottom layer material, and patterning process'20158,994,245'Permanent magnet type electrical rotating machine and permanent magnet type electrical rotating machine system for vehicle'20158,883,379'Resist-protective film-forming composition and patterning process'20148,877,422'Resist underlayer film composition and patterning process using the same'20148,853,031'Resist underlayer film composition and patterning process using the same'20148,846,303'Resist top coat composition and patterning process'20148,846,846'Naphthalene derivative, resist bottom layer material, and patterning process'20148,835,092'Resist underlayer film composition, process for forming resist underlayer film, patterning process and fullerene derivative'20148,835,697'Biphenyl derivative, resist bottom layer material, bottom layer forming method, and patterning process'20148,795,955'Naphthalene derivative, resist bottom layer material, resist bottom layer forming method, and patterning process'20148,760,095'Rotator control device, rotator system, vehicle, electric car and electric generation system'20148,663,898'Resist underlayer film composition and patterning process using the same'20148,652,756'Positive resist composition and patterning process'20148,653,703'Permanent magnetic rotating electric machine and wind power generating system'20148,603,732'Resist underlayer film-forming composition, process for forming resist underlayer film and patterning process'20138,592,956'Resist underlayer film composition and patterning process using the same'20138,574,816'Positive resist composition and patterning process'20138,421,285'Permanent magnet type electric power generator'20138,400,040'Permanent magnet type rotary electric machine'20138,350,434'Permanent magnet type rotary electric machine'20138,148,865'Permanent magnet rotating electrical machine and permanent magnet rotating electrical machine system'20127,994,666'Permanent magnet electrical rotating machine, wind power generating system, and a method of magnetizing a permanent magnet'20117,952,249'Permanent-magnet type electric rotating machine and permanent-magnet type electric rotating machine system for automobile or train'20117,847,456'Permanent magnet electrical rotating machine, wind power generating system, and a method of magnetizing a permanent magnet'2010

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

2010–2019Patents assigned to HITACHI LTD (19)· patent assignee history
2010–2016Based in Hitachinaka, JP· patent location history
2012–2015Patents assigned to KORI DAISUKE (18)· patent assignee history
2013–2021Patents assigned to SHINETSU CHEMICAL CO (46)· patent assignee history
2013–2014Patents assigned to KINSHO TAKESHI (9)· patent assignee history
2013–2014Patents assigned to OGIHARA TSUTOMU (9)· patent assignee history
2013–2021Based in Jyoetsu, JP· patent location history
2014–2021Based in Joetsu-shi, JP· patent location history
2014Based in Joetsuke, JP· patent location history
2016–2019Based in Tokyo, JP· patent location history

Inventor activity

Assignee and location history derived from the patent record.

Assignees
AssigneePatentsSpan
SHINETSU CHEMICAL CO462013–2021
HITACHI LTD192010–2019
KORI DAISUKEself182012–2015
KINSHO TAKESHI92013–2014
OGIHARA TSUTOMU92013–2014
Locations
LocationPatentsSpan
Jyoetsu, JP292013–2021
Joetsu-shi, JP162014–2021
Hitachinaka, JP142010–2016
Tokyo, JP52016–2019
Joetsuke, JP12014