Inventor
Hiroyuki Kitsunai
Inventor
Chiyoda-ku, JP
Overview
Patents· 31 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
H10Pprimary
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1034%
H01JElectric discharge tubes or discharge lamps22%
G05BControl or regulating systems in general15%
Y02PClimate change mitigation technologies in the production or processing of goods15%
G01NInvestigating or analysing materials by determining their chemical or physical properties2%
H05HPlasma technique2%
Y10STechnical subjects covered by former uspc cross-reference art collections [xracs] and digests2%
B05BSpraying apparatus1%
B82YSpecific uses or applications of nanostructures1%
C23CCoating metallic material1%
PatentTitleYear
10,153,128Charged particle beam apparatus and sample elevating apparatus20188,921,781'Measurement or inspecting apparatus'20148,680,466'Electron microscope, and specimen holding method'20148,653,459'Scanning electron microscope'20148,653,455'Charged particle beam device and evaluation method using the charged particle beam device'20148,519,332'Semiconductor inspecting apparatus'20138,232,522'Semiconductor inspecting apparatus'20127,601,240'Disturbance-free, recipe-controlled plasma processing system and method'20097,567,422'Plasma processing apparatus and plasma processing method'20097,473,332'Method for processing semiconductor'20097,376,479'Process monitoring device for sample processing apparatus and control method of sample processing apparatus'20087,343,217'System for monitoring and controlling a semiconductor manufacturing apparatus using prediction model equation'20087,158,848'Process monitoring device for sample processing apparatus and control method of sample processing apparatus'20077,147,748'Plasma processing method'20067,147,747'Plasma processing apparatus and plasma processing method'20067,122,096'Method and apparatus for processing semiconductor'20067,058,467'Process monitoring device for sample processing apparatus and control method of sample processing apparatus'20067,058,470'Method of monitoring and/or controlling a semiconductor manufacturing apparatus and a system therefor'20066,939,435'Plasma processing apparatus and processing method'20056,881,352'Disturbance-free, recipe-controlled plasma processing method'20056,879,867'Process monitoring device for sample processing apparatus and control method of sample processing apparatus'20056,828,165'Semiconductor plasma processing apparatus with first and second processing state monitoring units'20046,747,239'Plasma processing apparatus and method'20046,743,733'Process for producing a semiconductor device including etching using a multi-step etching treatment having different gas compositions in each step'20046,733,618'Disturbance-free, recipe-controlled plasma processing system and method'20046,706,543'Method of monitoring and/or controlling a semiconductor manufacturing apparatus and a therefor'20046,616,759'Method of monitoring and/or controlling a semiconductor manufacturing apparatus and a system therefor'20036,590,179'Plasma processing apparatus and method'20036,186,153'Plasma treatment method and manufacturing method of semiconductor device'20015,258,047'Holder device and semiconductor producing apparatus having same'19934,708,350'Magnetic liquid seal with magnetized deformable magnet'1987Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
1987–2009Patents assigned to HITACHI LTD (18)· patent assignee history
1993–2006Based in Ibaraki, JP· patent location history
2001–2009Based in Chiyoda-ku, JP· patent location history
2003–2004Based in Niihari-gun, JP· patent location history
2005–2018Patents assigned to HITACHI HIGH TECH CORP (12)· patent assignee history
2009–2014Based in Kasumigaura, JP· patent location history
2012–2014Patents assigned to KANNO SEIICHIRO (5)· patent assignee history
2012–2014Patents assigned to KITSUNAI HIROYUKI (5)· patent assignee history
2012–2014Patents assigned to MATSUSHIMA MASARU (5)· patent assignee history
2018Based in Tokyo, JP· patent location history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| HITACHI LTD | 18 | 1987–2009 |
| HITACHI HIGH TECH CORP | 12 | 2005–2018 |
| KANNO SEIICHIRO | 5 | 2012–2014 |
| KITSUNAI HIROYUKIself | 5 | 2012–2014 |
| MATSUSHIMA MASARU | 5 | 2012–2014 |
Locations
| Location | Patents | Span |
|---|---|---|
| Chiyoda-ku, JP | 16 | 2001–2009 |
| Kasumigaura, JP | 7 | 2009–2014 |
| Ibaraki, JP | 4 | 1993–2006 |
| Niihari-gun, JP | 2 | 2003–2004 |
| Tokyo, JP | 1 | 2018 |