Inventor
Masaru Tomono
Inventor
Koshi, JP
Overview
Patents· 7 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
G03Fprimary
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices41%
H01LSemiconductor devices29%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1029%
PatentTitleYear
10,747,121Optical processing apparatus and substrate processing apparatus202010,558,125Exposure apparatus, exposure apparatus adjustment method and storage medium202010,527,948Optical processing apparatus, coating/development apparatus, optical processing method, and non-transitory computer-readable storage medium202010,274,843Exposure apparatus, exposure method and storage medium201910,101,669Exposure apparatus, resist pattern forming method, and storage medium201810,025,190Substrate treatment system20189,899,243'Light irradiation apparatus'2018Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
2018–2020Patents assigned to TOKYO ELECTRON LTD (7)· patent assignee history
2018Patents assigned to UNIV OSAKA (1)· patent assignee history
2018–2020Based in Koshi, JP· patent location history
2018Based in Kumamoto, JP· patent location history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| TOKYO ELECTRON LTD | 7 | 2018–2020 |
| UNIV OSAKA | 1 | 2018 |
Locations
| Location | Patents | Span |
|---|---|---|
| Koshi, JP | 6 | 2018–2020 |
| Kumamoto, JP | 1 | 2018 |