LexDanaLexDanabeta
Inventor

HIROYUKI ONODA

Inventor
JP

Overview

4→
Patents
2024–2025
Patent span
Electricity
Primary field (CPC H)

Patents· 4 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

C23Cprimary
C23CCoating metallic material20%
H01JElectric discharge tubes or discharge lamps20%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1020%
H01LSemiconductor devices13%
H05HPlasma technique13%
Y02PClimate change mitigation technologies in the production or processing of goods13%
PatentTitleYear
12,482,635Plasma processing device, and plasma processing method202512,482,637Plasma source and plasma processing apparatus202512,312,683Substrate processing method and substrate processing device202512,020,900Plasma processing device, and plasma processing method2024

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

2024–2025Patents assigned to TOKYO ELECTRON LTD (4)· patent assignee history
2024–2025Based in JP· patent location history

Inventor activity

Assignee and location history derived from the patent record.

Assignees
AssigneePatentsSpan
TOKYO ELECTRON LTD42024–2025
Locations
LocationPatentsSpan
JP42024–2025