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Inventor

Akira Tanikawa

Inventor
Toyonaka, JP

Overview

6→
Patents
1995–2002
Patent span
Chemistry
Primary field (CPC C)

Patents· 6 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

D21Hprimary
D21HPulp compositions27%
Y10TTechnical subjects covered by former us classification27%
C08GMacromolecular compounds obtained otherwise than by reactions only involving unsaturated carbon-to-carbon bonds20%
C30BSingle-crystal growth13%
C08LCompositions of macromolecular compounds7%
C09DCoating compositions, e.g. paints, varnishes or lacquers7%
PatentTitleYear
6,387,506'Resin composition for paper-coating, coating composition for paper and coated paper'20026,039,799'Paper coating composition'20005,849,856'Water soluble resins and application thereof to paper coating'19985,654,359'Paper coating composition'19975,573,591'Method of exhausting silicon oxide'19965,476,065'System for pulling-up monocrystal and method of exhausting silicon oxide'1995

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

1995–1996Patents assigned to MITSUBISHI MATERIAL SILICON (2)· patent assignee history
1995–1996Patents assigned to MITSUBISHI MATERIALS CORP (2)· patent assignee history
1995–1996Based in Tokyo, JP· patent location history
1997–2002Patents assigned to SUMITOMO CHEMICAL CO (4)· patent assignee history
1997–1998Based in Osaka, JP· patent location history
2000–2002Based in Toyonaka, JP· patent location history

Inventor activity

Assignee and location history derived from the patent record.

Assignees
AssigneePatentsSpan
SUMITOMO CHEMICAL CO41997–2002
MITSUBISHI MATERIAL SILICON21995–1996
MITSUBISHI MATERIALS CORP21995–1996
Locations
LocationPatentsSpan
Toyonaka, JP22000–2002
Osaka, JP21997–1998
Tokyo, JP21995–1996