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Inventor

Kayoko Nagahara

Inventor
Kiyosu, JP

Overview

1→
Patents
2015
Patent span
Chemistry
Primary field (CPC C)

Patents· 1 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

B24Bprimary
B24BMachines, devices, or processes for grinding or polishing20%
C09GPolishing compositions20%
C09KMaterials for miscellaneous applications, not provided for elsewhere20%
H01LSemiconductor devices20%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1020%
PatentTitleYear
9,090,799'Composition for polishing and method of polishing semiconductor substrate using same'2015

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

2015Patents assigned to FUJIMI INC (1)· patent assignee history
2015Patents assigned to INOUE YUTAKA (1)· patent assignee history
2015Patents assigned to MIWA TOSHIHIRO (1)· patent assignee history
2015Patents assigned to NAGAHARA KAYOKO (1)· patent assignee history
2015Patents assigned to SHINODA TOSHIO (1)· patent assignee history
2015Based in Kiyosu, JP· patent location history

Inventor activity

Assignee and location history derived from the patent record.

Assignees
AssigneePatentsSpan
FUJIMI INC12015
INOUE YUTAKA12015
MIWA TOSHIHIRO12015
NAGAHARA KAYOKOself12015
SHINODA TOSHIO12015
Locations
LocationPatentsSpan
Kiyosu, JP12015