Inventor

Hisaki Abe

Inventor

Niigata, JP

Overview

9→

Patents

1993–2004

Patent span

Chemistry

Primary field (CPC C)

Patents· 9 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

G03Fprimary

G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices28%

H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1020%

C11DDetergent compositions12%

B01JChemical or physical processes, e.g. catalysis or colloid chemistry8%

C01BNon-metallic elements8%

C23GCleaning or de-greasing of metallic material by chemical methods other than electrolysis8%

C03CChemical composition of glasses, glazes or vitreous enamels4%

G02FOptical devices or arrangements for the control of light by modification of the optical properties of the media of the elements involved therein4%

H05KPrinted circuits4%

H10WGeneric packages, interconnections, connectors or other constructional details of devices covered by class h104%

PatentTitleYear

6,815,150'Photoresist stripping composition and process for stripping resist'2004 6,686,322'Cleaning agent and cleaning process using the same'2004 6,638,694'Resist stripping agent and process of producing semiconductor devices using the same'2003 6,500,270'Resist film removing composition and method for manufacturing thin film circuit element using the composition'2002 6,458,517'Photoresist stripping composition and process for stripping photoresist'2002 6,440,326'Photoresist removing composition'2002 6,323,169'Resist stripping composition and process for stripping resist'2001 5,338,462'Active carbon materials, process for the preparation thereof and the use thereof'1994 5,242,879'Active carbon materials, process for the preparation thereof and the use thereof'1993

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

1993–2004Patents assigned to MITSUBISHI GAS CHEMICAL CO (9)· patent assignee history

1993–2004Based in Niigata, JP· patent location history

2002–2004Patents assigned to SHARP KK (4)· patent assignee history

Inventor activity

Assignee and location history derived from the patent record.

Assignees

Assignee	Patents	Span
MITSUBISHI GAS CHEMICAL CO	9	1993–2004
SHARP KK	4	2002–2004

Locations

Location	Patents	Span
Niigata, JP	9	1993–2004