Inventor
Johannes M. M. Pasmans
Inventor
Eindhoven, NL
Overview
Patents· 4 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
C03Cprimary
C03CChemical composition of glasses, glazes or vitreous enamels22%
G02BOptical elements, systems or apparatus22%
G01JMeasurement of intensity, velocity, spectral content, polarisation, phase or pulse characteristics of infrared, visible or ultraviolet light11%
G21KHandling of particles or ionising radiation not otherwise provided for11%
H01JElectric discharge tubes or discharge lamps11%
H01SDevices using the process of light amplification by stimulated emission of radiation [laser] to amplify or generate light11%
H04NPictorial communication, e.g. television11%
PatentTitleYear
4,731,558'Method of reducing the reflectance of a transparent viewing screen and viewing screen with reduced reflectance'19884,617,206'Method of manufacturing a layer of an oxide of an element from group IVa'19864,547,801'Tunable Fabry-Perot interferometer and X-ray display device having such an interferometer'19854,099,840'Multilayer reflector for gas discharge laser'1978Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
1978–1988Patents assigned to PHILIPS CORP (4)· patent assignee history
1978–1988Based in Eindhoven, NL· patent location history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| PHILIPS CORP | 4 | 1978–1988 |
Locations
| Location | Patents | Span |
|---|---|---|
| Eindhoven, NL | 4 | 1978–1988 |