Inventor
Terrance Y. Lee
Inventor
Oakland, CA, US
Overview
Patents· 17 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
H10Pprimary
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1019%
H01LSemiconductor devices12%
C23CCoating metallic material9%
G01BMeasuring length, thickness or similar linear dimensions9%
B24BMachines, devices, or processes for grinding or polishing7%
G01NInvestigating or analysing materials by determining their chemical or physical properties7%
B24DTools for grinding, buffing or sharpening6%
B29CShaping or joining of plastics6%
B29KIndexing scheme associated with subclasses b29b, b29c or b29d, relating to moulding materials or to materials for moulds, reinforcements, fillers or preformed parts, e.g. inserts6%
B29LIndexing scheme associated with subclass b29c, relating to particular articles6%
PatentTitleYear
11,057,509Apparatus and method for providing incoming and outgoing call information in a mobile communication terminal202110,843,306Printing a chemical mechanical polishing pad202010,793,954PECVD process202010,527,407In-situ metrology method for thickness measurement during PECVD processes202010,500,694Chemical mechanical polishing apparatus and methods201910,354,875Techniques for improved removal of sacrificial mask201910,281,261In-situ metrology method for thickness measurement during PECVD processes201910,060,032PECVD process201810,029,405Printing a chemical mechanical polishing pad201810,030,306PECVD apparatus and process20189,816,187'PECVD process'20179,744,724'Apparatus for printing a chemical mechanical polishing pad'20179,457,520'Apparatus for printing a chemical mechanical polishing pad'20169,458,537'PECVD process'20169,157,730'PECVD process'20159,067,299'Printed chemical mechanical polishing pad'20155,292,399'Plasma etching apparatus with conductive means for inhibiting arcing'1994Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
1994–2020Patents assigned to APPLIED MATERIALS INC (15)· patent assignee history
1994–2020Based in Oakland, CA, US· patent location history
2015Patents assigned to BAJAJ RAJEEV (1)· patent assignee history
2015Patents assigned to CHIN BARRY LEE (1)· patent assignee history
2015Patents assigned to LEE TERRANCE Y (1)· patent assignee history
2021Patents assigned to SAMSUNG ELECTRONICS CO LTD (1)· patent assignee history
2021Based in Seoul, KR· patent location history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| APPLIED MATERIALS INC | 15 | 1994–2020 |
| BAJAJ RAJEEV | 1 | 2015 |
| CHIN BARRY LEE | 1 | 2015 |
| LEE TERRANCE Yself | 1 | 2015 |
| SAMSUNG ELECTRONICS CO LTD | 1 | 2021 |
Locations
| Location | Patents | Span |
|---|---|---|
| Oakland, California, US | 16 | 1994–2020 |
| Seoul, KR | 1 | 2021 |